SCHEMBL493095

SCHEMBL493095

C=C(C)C(=O)OC(=O)C(C)(C)C

nearest known ligand 0.46

Predicted protein targets (top 6)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.46
TSHR P16473 4/20 0.37
TDP1 Q9NUW8 2/20 0.36
HSD17B10 Q99714 1/20 0.36
THRB P10828 1/20 0.34
ELANE P08246 2/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Di(Hydroxyethyl)Ether SCHEMBL11105122 0.84 THRB (0.38) ALDH1A1TSHRTHRB
SCHEMBL3122471 0.79 ELANE (0.33) ALDH1A1TSHRELANE
SCHEMBL3849335 0.79 ELANE (0.33) ALDH1A1TSHRELANE
SCHEMBL1417405 0.79 TDP1 (0.52) ALDH1A1TSHRTDP1HSD17B10ELANE
SCHEMBL1309417 0.78 ALDH1A1 (0.44) ALDH1A1TSHRTDP1HSD17B10THRB
SCHEMBL28170047 0.78 ALDH1A1 (0.61) ALDH1A1TSHRTDP1HSD17B10THRB
SCHEMBL15963 0.78 ALDH1A1 (0.61) ALDH1A1TSHRTDP1HSD17B10THRB
SCHEMBL6824350 0.78 ALDH1A1 (0.39) ALDH1A1TSHRTDP1HSD17B10THRB
SCHEMBL4943039 0.77 ELANE (0.32) ELANE
Hydrochloric Acid SCHEMBL17099626 0.75 ALDH1A1 (0.58) ALDH1A1TSHRTDP1HSD17B10THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4267708-B1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS INFINEUM INT LTD (GB) 2025-07-02 EP disclosed
US-12281203-B2 Thermally responsive brush polymers having a copolymer backbone and copolymer arms INFINEUM INTERNATIONAL LIMITED (GB) 2025-04-22 US disclosed
US-20240384227-A1 MATERIALS CHEMISTRIES AND MICROTOPOGRAPHIES AND USES THEREOF THE UNIVERSITY OF NOTTINGHAM (GB) 2024-11-21 US disclosed
US-20240309155-A1 Thermally Responsive Brush Polymers Having a Copolymer Backbone and Copolymer Arms INFINEUM INTERNATIONAL LIMITED (GB) 2024-09-19 US disclosed
EP-4267708-A1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS Infineum International Limited (GB) 2023-11-01 EP disclosed
CN-116981758-A Thermally responsive brush polymers having a copolymer backbone and copolymer arms 英菲诺姆国际有限公司 2023-10-31 CN disclosed
CN-116173036-A E Mi Litong for glioma 昂克希尔迪克斯有限公司 2023-05-30 CN disclosed
WO-2022136384-A1 THERMALLY RESPONSIVE BRUSH POLYMERS HAVING A COPOLYMER BACKBONE AND COPOLYMER ARMS INFINEUM INTERNATIONAL LIMITED (GB) 2022-06-30 WO disclosed
CN-107175094-A Composite carried catalyst for aldol condensation and preparation method and application 上海浦景化工技术股份有限公司 2017-09-19 CN disclosed
EP-2103592-B1 Hydroxyl-containing monomer, polymer, resist composition, and patterning process SHINETSU CHEMICAL CO (JP) 2015-06-03 EP disclosed
US-20110060112-A1 ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS KURARAY CO., LTD. (JP) 2011-03-10 US disclosed
US-20110009643-A1 METHOD FOR PRODUCING ACRYLATE DERIVATIVE, ACRYLATE DERIVATIVE, AND INTERMEDIATE THEREOF KURARAY CO., LTD. (JP) 2011-01-13 US disclosed
US-7867690-B2 Tertiary alcohol derivative, polymer compound and photoresist composition KURARAY CO., LTD. (JP) 2011-01-11 US disclosed
US-20100304295-A1 ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-12-02 US disclosed
US-20090239179-A1 HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2009-09-24 US disclosed
EP-2103592-A2 Hydroxyl-containing monomer, polymer, resist composition, and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2009-09-23 EP disclosed
US-20090035700-A1 TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION KURARAY CO., LTD. (JP) 2009-02-05 US disclosed
US-20090029290-A1 TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION KURARAY CO., LTD. (JP) 2009-01-29 US disclosed
EP-1992650-A1 TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION Kuraray Co., Ltd. (JP) 2008-11-19 EP disclosed
EP-1992651-A1 TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION Kuraray Co., Ltd. (JP) 2008-11-19 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20090029290-A1 TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION ADH1A, ADH1C, ADH5 ALDH1A1 247/4885TSHR 2294/4885TDP1 2427/4885
US-20090239179-A1 HYDROXYL-CONTAINING MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS RAD51, REV1, H1-0 ALDH1A1 774/4885TSHR 2056/4885TDP1 1063/4885
US-20110060112-A1 ACRYLATE ESTER DERIVATIVES AND POLYMER COMPOUNDS RAD51, LBR, RPLP0 ALDH1A1 2980/4885TSHR 2990/4885TDP1 3475/4885
US-20110009643-A1 METHOD FOR PRODUCING ACRYLATE DERIVATIVE, ACRYLATE DERIVATIVE, AND INTERMEDIATE THEREOF ACR, ADH1A, ALAD ALDH1A1 13/4885TSHR 3908/4885TDP1 2750/4885
US-20090035700-A1 TERTIARY ALCOHOL DERIVATIVE, POLYMER COMPOUND AND PHOTORESIST COMPOSITION ADH1A, ADH1C, CCNT1 ALDH1A1 337/4885TSHR 1932/4885TDP1 3102/4885
US-20100304295-A1 ACID-LABILE ESTER MONOMER HAVING SPIROCYCLIC STRUCTURE, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS COASY, DHCR24, HCAR1 ALDH1A1 404/4885TSHR 1968/4885TDP1 4659/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.