SCHEMBL7799142

SCHEMBL7799142

Oc1ccccc1C(Cc1cccc(O)c1O)c1ccccc1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
IAPP P10997 3/20 0.46
GABRA1 P14867 2/20 0.45
GABRB2 P47870 2/20 0.45
TSHR P16473 1/20 0.44
HPGD P15428 2/20 0.42
ADAMTS4 O75173 1/20 0.42
ALDH1A1 P00352 1/20 0.42
EGFR P00533 1/20 0.42
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
LMNA P02545 1/20 0.42
FYN P06241 1/20 0.42
MMP2 P08253 1/20 0.42
MMP9 P14780 1/20 0.42
ALOX15 P16050 1/20 0.42
MMP8 P22894 1/20 0.42
CA6 P23280 1/20 0.42
CDK2 P24941 1/20 0.42
MMP12 P39900 1/20 0.42
RECQL P46063 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL231791 0.88 HSPA5 (0.50) GABRA1GABRB2TSHRHPGDCA2
SCHEMBL29611994 0.88 HSPA5 (0.50) GABRA1GABRB2TSHRHPGDCA2
SCHEMBL18076591 0.81 TSHR (0.46) GABRA1GABRB2TSHRHPGDALDH1A1
SCHEMBL29120613 0.78 HPGD (0.48) GABRA1GABRB2TSHRHPGDCA2
SCHEMBL7809709 0.78 MPO (0.45) IAPPGABRA1GABRB2TSHRHSPA5
SCHEMBL5440489 0.77 POLB (0.52) GABRA1GABRB2TSHRPOLB
SCHEMBL10430786 0.77 GABRA1 (0.50) IAPPGABRA1GABRB2TSHRHPGD
SCHEMBL490685 0.76 KMT2A (0.52) IAPPGABRA1GABRB2HPGDADAMTS4
SCHEMBL29812362 0.75 GABRA1 (0.59) IAPPGABRA1GABRB2TSHRHPGD
SCHEMBL1053654 0.75 GABRA1 (0.79) IAPPGABRA1GABRB2TSHRHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed