SCHEMBL7804680

SCHEMBL7804680

Cc1cc(O)c(-c2ccccc2C2CCCCC2)cc1C(c1cc(-c2ccccc2C2CCCCC2)c(O)cc1C)c1ccccc1O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PTGS2 P35354 1/20 0.38
MEN1 O00255 3/20 0.34
KMT2A Q03164 3/20 0.34
LMNA P02545 1/20 0.34
TDP1 Q9NUW8 1/20 0.34
PTPN5 P54829 3/20 0.34
PTPN2 P17706 1/20 0.34
MAPT P10636 2/20 0.33
KDM4E B2RXH2 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
BCHE P06276 1/20 0.33
ACHE P22303 1/20 0.33
NPSR1 Q6W5P4 1/20 0.32
GABRA1 P14867 1/20 0.32
GABRB2 P47870 1/20 0.32
NUDT1 P36639 1/20 0.32
BACE1 P56817 1/20 0.32
HSP90AA1 P07900 1/20 0.32
HDAC4 P56524 1/20 0.31
HDAC2 Q92769 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29375612 0.87 NUDT1 (0.37) MEN1KMT2ALMNATDP1MAPT
SCHEMBL30127784 0.87 NUDT1 (0.37) MEN1KMT2ALMNATDP1MAPT
SCHEMBL757158 0.87 NUDT1 (0.37) MEN1KMT2ALMNATDP1MAPT
SCHEMBL760343 0.82 GABRA1 (0.35) MEN1KMT2ALMNATDP1MAPT
SCHEMBL29484425 0.82 GABRA1 (0.35) MEN1KMT2ALMNATDP1MAPT
SCHEMBL15703018 0.79 NUDT1 (0.32) NUDT1BACE1HSP90AA1
SCHEMBL9356995 0.77 HDAC4 (0.35) MEN1KMT2APTPN5PTPN2MAPT
SCHEMBL7804684 0.77 NUDT1 (0.39) PTGS2MEN1KMT2AMAPTNPSR1
SCHEMBL2312929 0.76 HDAC4 (0.43) KMT2ALMNATDP1MAPTKDM4E
SCHEMBL278769 0.76 NUDT1 (0.40) MEN1KMT2AMAPTKDM4ENUDT1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6316170-B2 COATING, EXPOSURE, DEVELOPMENT AND HEAT TREATMENT KABUSHIKI KAISHA TOSHIBA (JP) 2001-11-13 US disclosed
US-20010006767-A1 Developing solution and method of forming polyimide pattern by using the developing solution YOSHIAKI KAWAMONZEN 2001-07-05 US disclosed