Water

Water

SCHEMBL781994

O.O[Si](O)(O)O.[KH]

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

Known targets — ChEMBL curated mechanism

ABCC9ABL1ACEACHEACVR1ADORA1ADORA2AADORA2BADORA3ADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3AGTR1ALOX5ATP4AATP4BBCRBTKCACNA1ACACNA1BCACNA1CCACNA1DCACNA1ECACNA1FCACNA1GCACNA1HCACNA1ICACNA1SCACNA2D1CACNA2D2CACNA2D3CACNA2D4CACNB1CACNB2CACNB3CACNB4CACNG1CACNG2CACNG3CACNG4CACNG5CACNG6CACNG7CACNG8CALCRLCFBCHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGCRBNCUL4ACXCR1CXCR2DDB1DDCDHFRDPP4DRD2DRD3DRD4EGFRERBB2ERBB4ESR1ESR2FDPSFKBP1AFLT1FLT3FLT4GARTGHSRGRIA1GRIA2GRIA3GRIA4GRIK1GRIK2GRIK3GRIK4GRIK5GRIN2AGSK3AGSK3BHDAC1HDAC10HDAC11HDAC2HDAC3HDAC4HDAC5HDAC6HDAC7HDAC8HDAC9HRH1HTR1AHTR1BHTR1DHTR1EHTR1FHTR2AHTR2BHTR2CHTR3AHTR3BHTR3CHTR3DHTR3EHTR4HTR5AHTR6HTR7IDH1IDH2IMPA1ITGA2BITGB3JAK1JAK2JAK3KCNJ11KCNK3KCNK9KDRKITMEN1METMMP1MMP13MMP7MMP8NANOD2NS5bODC1OPG057OPRD1OPRK1OPRM1PPARP1PARP2PDE3APDE3BPDE4APDE4BPDE4CPDE4DPDGFRBPIK3CAPIK3CBPIK3CDPIK3CGPIK3R1PIK3R2PIK3R3PIK3R5PKLRPPARDPPATPTGS1PTGS2RBX1ROCK1ROCK2RRM1RRM2RRM2BSCN10ASCN11ASCN1ASCN2ASCN3ASCN4ASCN5ASCN7ASCN8ASCN9ASCNN1ASCNN1BSCNN1GSIGMAR1SLC10A2SLC5A2SLC6A2SLC6A3SLC6A4SLC9A3SYKTACR1THRATHRBTOP1TUBA1ATUBA1BTUBA1CTUBA3CTUBA3ETUBA4ATUBBTUBB1TUBB2ATUBB2BTUBB3TUBB4ATUBB4BTUBB6TUBB8TYK2TYMSVDRampCblablaT-3blaT-4blaT-5blaT-6blaUOE-1dacAdacBdacCfolAfolPftsIgyrAgyrBileSmecAmrcAmrcBmrdAparCparEpbp2pbp4pbpApbpFrplArplBrplCrplDrplErplFrplIrplJrplKrplLrplMrplNrplOrplPrplQrplRrplSrplTrplUrplVrplWrplXrplYrpmArpmBrpmCrpmDrpmErpmE2rpmFrpmGrpmG1rpmG2rpmG3rpmHrpmIrpmJrpsArpsBrpsCrpsDrpsErpsFrpsGrpsHrpsIrpsJrpsKrpsLrpsMrpsNrpsOrpsPrpsQrpsRrpsSrpsTrpsUthyAykgMykgO

The experimentally established mechanism targets of Water. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Water SCHEMBL8169807 1.00
Water SCHEMBL28696356 1.00
Water SCHEMBL1109687 1.00
Water SCHEMBL27412506 0.93
Water SCHEMBL665405 0.93
Water SCHEMBL663593 0.93
Water SCHEMBL28974157 0.93
Water SCHEMBL11407418 0.93
Water SCHEMBL8650554 0.91
Water SCHEMBL8169302 0.91

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 208 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122080727-A 8B cold-rolled precise steel strip and manufacturing method thereof 2026-05-26 CN claimed
CN-118185127-A Organic-inorganic hybridized nano clay and preparation method and application thereof 合肥中科科乐新材料有限责任公司 2024-06-14 CN claimed
CN-111662019-B Intelligent automobile glass and preparation method thereof 惠州学院 2024-05-31 CN claimed
CN-116102020-B Preparation method of silica aerogel and silica aerogel 湖南奥飞新材料有限公司 2024-05-17 CN claimed
CN-111683924-B Highly stable and alkaline cleaning solutions and soluble surfactants 赢创运营有限公司 2023-12-29 CN claimed
CN-116161948-B Geopolymer-based multi-phase ceramic high-level radioactive waste liquid curing material and curing method thereof 武汉理工大学 2023-11-28 CN claimed
CN-116617896-A Thixotropic ceramic coating production device and production process 南阳隆晟新材料科技有限公司 2023-08-22 CN claimed
US-11708305-B2 Geopolymer molding production method and geopolymer molding production system KABUSHIKI KAISHA TOSHIBA (JP) 2023-07-25 US claimed
CN-116161948-A Geopolymer-based multi-phase ceramic high-level radioactive waste liquid curing material and curing method thereof 武汉理工大学 2023-05-26 CN claimed
CN-116102020-A Preparation method of silica aerogel and silica aerogel 湖南奥飞新材料有限公司 2023-05-12 CN claimed
CN-103830734-A Preparation method and use of silica/metal composite material DONGGUAN CHANGAN DONGYANGGUANG ALUMINIUM RES DEV CO LTD 2014-06-04 CN claimed
CN-103588210-A Preparation method of nano silicon dioxide DONGGUAN CHANGANDONG SUNSHINE ALUMINIUM RES DEV CO LTD 2014-02-19 CN claimed
CN-103031133-A Flame-retardant inorganic composition YU JUNJIE 2013-04-10 CN claimed
WO-2004076034-A1 GAS SCRUBBING REAGENT AND METHODS FOR USING SAME VANDINE ROBERT W (US) 2004-09-10 WO claimed
US-20040166043-A1 Gas scrubbing reagent and methods for using same VANDINE ROBERT W (US) 2004-08-26 US claimed
CN-1291126-A Adrasive article and method for grinding glass MINNESOTA MINING & MFG (US) 2001-04-11 CN claimed
EP-0883570-A4 STABLE HIGH SOLIDS, HIGH RATIO ALKALI METAL SILICATE SOLUTIONS PQ HOLDING INC (US) 1999-06-02 EP claimed
EP-0883570-A1 STABLE HIGH SOLIDS, HIGH RATIO ALKALI METAL SILICATE SOLUTIONS PQ Holding, Inc. (US) 1998-12-16 EP claimed
WO-1997030935-A1 STABLE HIGH SOLIDS, HIGH RATIO ALKALI METAL SILICATE SOLUTIONS PQ CORPORATION (US) 1997-08-28 WO claimed
US-5624651-A Stable high solids, high ratio alkali metal silicate solutions PQ CORPORATION (US) 1997-04-29 US claimed