Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | PRKCA | P17252 | 1/20 | 0.33 |
| ▸ | PKM | P14618 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.32 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.32 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.32 |
| ▸ | MEN1 | O00255 | 2/20 | 0.32 |
| ▸ | MAPT | P10636 | 1/20 | 0.32 |
| ▸ | ATM | Q13315 | 1/20 | 0.30 |
| ▸ | CYP17A1 | P05093 | 1/20 | 0.30 |
| ▸ | CYP19A1 | P11511 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL785903 | 0.87 | ALDH1A1 (0.33) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL685296 | 0.86 | PRKCA (0.36) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL12727288 | 0.85 | ALDH1A1 (0.32) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL785730 | 0.85 | ALDH1A1 (0.37) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL12727289 | 0.83 | MEN1 (0.31) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL2610451 | 0.82 | ALDH1A1 (0.44) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL18922636 | 0.81 | PRKCA (0.39) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL15250480 | 0.81 | ALDH1A1 (0.34) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL1398391 | 0.80 | ALDH1A1 (0.43) | PRKCAPKMALDH1A1KMT2ANPSR1 | |
| SCHEMBL12854582 | 0.80 | PRKCA (0.32) | PRKCAALDH1A1KMT2ANPSR1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9229320-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-01-05 | — | — | US | disclosed |
| US-20150301451-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-10-22 | — | — | US | disclosed |
| US-9051405-B2 | Resin and resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-06-09 | — | — | US | disclosed |
| US-20150132698-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2015-05-14 | — | — | US | disclosed |
| US-8574811-B2 | Resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-11-05 | — | — | US | disclosed |
| US-8546059-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-10-01 | — | — | US | disclosed |
| US-8530135-B2 | Photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-09-10 | — | — | US | disclosed |
| US-8354217-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2013-01-15 | — | — | US | disclosed |
| US-8318403-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-11-27 | — | — | US | disclosed |
| US-8278023-B2 | Salt and photoresist composition containing the same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-10-02 | — | — | US | disclosed |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2012-01-12 | — | — | US | disclosed |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-12-29 | — | — | US | disclosed |
| US-20110123926-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-05-26 | — | — | US | disclosed |
| US-20110091807-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-04-21 | — | — | US | disclosed |
| US-20110076617-A1 | PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2011-03-31 | — | — | US | disclosed |
| US-20100323296-A1 | RESIN AND RESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-23 | — | — | US | disclosed |
| US-20100304294-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100304292-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | SUMITOMO CHEMICAL COMMPANY, LIMITED (JP) | 2010-12-02 | — | — | US | disclosed |
| US-20100203446-A1 | CHEMICALLY AMPLIFIED PHOTORESIST COMPOSITION AND METHOD FOR FORMING PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2010-08-12 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (6 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100304296-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | C1S, H1-0, H1-2 | PRKCA 2551/4885PKM 4244/4885ALDH1A1 918/4885 |
| US-20100304294-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | AFF1, F12, AP2A1 | PRKCA 3340/4885PKM 3972/4885ALDH1A1 667/4885 |
| US-20120009519-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | C1R, C1S, C9 | PRKCA 4663/4885PKM 3923/4885ALDH1A1 2064/4885 |
| US-20110091807-A1 | PHOTORESIST COMPOSITION | H1-0, H1-2, H1-3 | PRKCA 2983/4885PKM 3682/4885ALDH1A1 1807/4885 |
| US-20110318690-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | RCOR1, C1R, C1S | PRKCA 4587/4885PKM 4153/4885ALDH1A1 1376/4885 |
| US-20100304292-A1 | SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME | CRY1, CHRM1, C1S | PRKCA 3851/4885PKM 3891/4885ALDH1A1 1184/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.