Predicted protein targets (top 8)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | FKBP1A | P62942 | 5/20 | 0.35 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | HMGCR | P04035 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | POLB | P06746 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.31 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.31 |
| ▸ | MEN1 | O00255 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL785892 | 0.95 | FKBP1A (0.37) | FKBP1AKMT2AHMGCRMEN1 | |
| SCHEMBL26650279 | 0.88 | KMT2A (0.34) | KMT2ALMNAPOLBALDH1A1KDM4E | |
| SCHEMBL15697291 | 0.85 | LMNA (0.33) | KMT2ALMNAPOLBALDH1A1KDM4E | |
| SCHEMBL18403032 | 0.85 | KMT2A (0.33) | KMT2ALMNAPOLBALDH1A1KDM4E | |
| SCHEMBL15697292 | 0.85 | LMNA (0.34) | FKBP1AHMGCRLMNAPOLBALDH1A1 | |
| SCHEMBL10214225 | 0.83 | FKBP1A (0.31) | FKBP1A | |
| SCHEMBL12797022 | 0.82 | FKBP1A (0.33) | FKBP1AHMGCR | |
| SCHEMBL15699342 | 0.82 | KMT2A (0.33) | KMT2ALMNAPOLBALDH1A1KDM4E | |
| SCHEMBL12555561 | 0.82 | BCHE (0.32) | KMT2AHMGCRALDH1A1KDM4EMEN1 | |
| SCHEMBL12587749 | 0.81 | PDK1 (0.31) | KMT2A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 126 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230305403-A1 | PATTERN FORMING METHOD, MANUFACTURING METHOD OF CIRCUIT BOARD, AND LAMINATE | FUJIFILM CORPORATION (JP) | 2023-09-28 | — | — | US | disclosed |
| US-20230194988-A1 | TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-06-22 | — | — | US | disclosed |
| US-20230125445-A1 | COMPOSITION, TRANSFER FILM, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR CIRCUIT WIRE, AND MANUFACTURING METHOD FOR ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-04-27 | — | — | US | disclosed |
| US-10031419-B2 | Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device | FUJIFILM CORPORATION (JP) | 2018-07-24 | — | — | US | disclosed |
| US-20180196178-A1 | RESIN FILM, COLORING PHOTOSENSITIVE COMPOSITION, RESIN FILM PRODUCTION METHOD, COLOR FILTER, LIGHT SHIELDING FILM, SOLID-STATE IMAGING ELEMENT, AND IMAGE DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2018-07-12 | — | — | US | disclosed |
| US-20180175299-A1 | ORGANIC THIN FILM TRANSISTOR, METHOD OF MANUFACTURING ORGANIC THIN FILM TRANSISTOR, ORGANIC SEMICONDUCTOR COMPOSITION, ORGANIC SEMICONDUCTOR FILM, AND METHOD OF MANUFACTURING ORGANIC SEMICONDUCTOR FILM | FUJIFILM CORPORATION (JP) | 2018-06-21 | — | — | US | disclosed |
| US-9994538-B2 | Latent acids and their use | BASF SE (DE) | 2018-06-12 | — | — | US | disclosed |
| US-20180120701-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2018-05-03 | — | — | US | disclosed |
| US-20180087010-A1 | PRE-RINSING LIQUID, PRE-RINSING TREATMENT METHOD, AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2018-03-29 | — | — | US | disclosed |
| US-20180040824-A1 | LAMINATE AND KIT | FUJIFILM CORPORATION (JP) | 2018-02-08 | — | — | US | disclosed |
| US-8211615-B2 | Copolymer for immersion lithography and compositions | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-07-03 | — | — | US | disclosed |
| US-20120071638-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2012-03-22 | — | — | US | disclosed |
| US-20120045616-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2012-02-23 | — | — | US | disclosed |
| US-8067516-B2 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-11-29 | — | — | US | disclosed |
| US-7960494-B2 | Copolymer for semiconductor lithography and process for producing the same | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2011-06-14 | — | — | US | disclosed |
| US-20100143842-A1 | METHOD FOR PRODUCING A COPOLYMER SOLUTION WITH A UNIFORM CONCENTRATION FOR SEMICONDUCTOR LITHOGRAPHY | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2010-06-10 | — | — | US | disclosed |
| US-20100062371-A1 | Copolymer and composition for semiconductor lithography and process for producing the copolymer | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-03-11 | — | — | US | disclosed |
| US-20100047710-A1 | COPOLYMER FOR IMMERSION LITHOGRAPHY AND COMPOSITIONS | MARUZEN PETROCHEMICAL CO., LTD (JP) | 2010-02-25 | — | — | US | disclosed |
| US-20090306328-A1 | COPOLYMER FOR SEMICONDUCTOR LITHOGRAPHY AND PROCESS FOR PRODUCING THE SAME | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2009-12-10 | — | — | US | disclosed |
| US-20070269741-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | MARUZEN PETROCHEMICAL CO., LTD. (JP) | 2007-11-22 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120071638-A1 | Copolymer for positive type lithography, polymerization initiator used in production of said copolymer, and composition for semiconductor lithography | FRG1, H1-10, POLL | FKBP1A 2330/4885KMT2A 1497/4885HMGCR 3921/4885 |
| US-20120045616-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE | PELP1, EED, ARCN1 | FKBP1A 2759/4885KMT2A 915/4885HMGCR 4255/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.