Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2D6 | P10635 | 3/20 | 0.40 |
| ▸ | CYP2C9 | P11712 | 2/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.40 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.40 |
| ▸ | PKM | P14618 | 2/20 | 0.40 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.40 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.40 |
| ▸ | TP53 | P04637 | 2/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | G6PD | P11413 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 1/20 | 0.40 |
| ▸ | ALOX12 | P18054 | 1/20 | 0.40 |
| ▸ | CCR6 | P51684 | 1/20 | 0.40 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 2/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30450086 | 1.00 | CYP2D6 (0.40) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL14268305 | 0.87 | ALOX15 (0.60) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL4761848 | 0.85 | LMNA (0.50) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL11173027 | 0.82 | ALOX15 (0.40) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL12964411 | 0.82 | LMNA (0.47) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL27999433 | 0.82 | RORC (0.42) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL29359445 | 0.81 | CYP2C9 (0.65) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL9940373 | 0.81 | GABRA1 (0.41) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL26591 | 0.81 | CYP2C9 (0.65) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 | |
| SCHEMBL29368497 | 0.81 | CYP2C9 (0.65) | CYP2D6CYP2C9ALOX15CYP2C19ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 52 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0496640-B2 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 2001-09-19 | — | — | EP | claimed |
| EP-0496640-B1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-06-11 | — | — | EP | claimed |
| US-5413896-A | Light sensitive element with novolak resin and quinonediazide compounds | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-05-09 | — | — | US | claimed |
| EP-0496640-A1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-29 | — | — | EP | claimed |
| US-9529291-B2 | Image forming apparatus and image forming method | FUJI XEROX CO., LTD. (JP) | 2016-12-27 | — | — | US | disclosed |
| US-20160349639-A1 | IMAGE FORMING APPARATUS AND IMAGE FORMING METHOD | FUJI XEROX CO., LTD. (JP) | 2016-12-01 | — | — | US | disclosed |
| US-9383646-B2 | Two-step photoresist compositions and methods | IRRESISTIBLE MATERIALS LTD (GB) | 2016-07-05 | — | — | US | disclosed |
| US-9323149-B2 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2016-04-26 | — | — | US | disclosed |
| US-9256126-B2 | Methanofullerenes | IRRESISTIBLE MATERIALS LTD (GB) | 2016-02-09 | — | — | US | disclosed |
| US-9229322-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2016-01-05 | — | — | US | disclosed |
| CN-104884423-A | methanofullerene | ROBINSON ALEX PHILIP GRAHAM | 2015-09-02 | — | — | CN | disclosed |
| US-9122156-B2 | Composition of matter and molecular resist made therefrom | IRRESISTIBLE MATERIALS LTD (GB) | 2015-09-01 | — | — | US | disclosed |
| US-5798422-A | USEFUL AS A COLOR-DEVELOPING SHEET IN ITS MULTIVALENT-METAL-MODIFIED FORM | MITSUI TOATSU CHEMICALS, INC. (JP) | 1998-08-25 | — | — | US | disclosed |
| EP-0496640-B1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-06-11 | — | — | EP | disclosed |
| EP-0660187-B1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| US-5556734-A | RESISTS | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1996-09-17 | — | — | US | disclosed |
| US-5534382-A | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1996-07-09 | — | — | US | disclosed |
| EP-0660187-A1 | Radiation-sensitive resin composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-06-28 | — | — | EP | disclosed |
| US-5413896-A | Light sensitive element with novolak resin and quinonediazide compounds | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1995-05-09 | — | — | US | disclosed |
| EP-0496640-A1 | I-ray sensitive positive resist composition | JAPAN SYNTHETIC RUBBER CO., LTD. (JP) | 1992-07-29 | — | — | EP | disclosed |