Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.44 |
| ▸ | MTNR1A | P48039 | 3/20 | 0.42 |
| ▸ | MTNR1B | P49286 | 3/20 | 0.42 |
| ▸ | TSHR | P16473 | 3/20 | 0.41 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.41 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.41 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.41 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.41 |
| ▸ | NSD2 | O96028 | 1/20 | 0.41 |
| ▸ | HTR1D | P28221 | 1/20 | 0.41 |
| ▸ | HTR1B | P28222 | 1/20 | 0.41 |
| ▸ | MAOB | P27338 | 2/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 3/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.39 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.39 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4960444 | 0.87 | APP (0.39) | NPSR1MTNR1AMTNR1BTSHRALDH1A1 | |
| SCHEMBL873981 | 0.87 | MAOB (0.51) | ALDH1A1KDM4EMAOBL3MBTL1KMT2A | |
| SCHEMBL3823297 | 0.86 | ALDH1A1 (0.30) | NPSR1ALDH1A1 | |
| SCHEMBL5702516 | 0.84 | LMNA (0.52) | MTNR1AMTNR1BALDH1A1HTR1DHTR1B | |
| SCHEMBL8751833 | 0.82 | GPBAR1 (0.43) | NPSR1MTNR1AMTNR1BTSHRHIF1A | |
| SCHEMBL7864203 | 0.81 | NQO1 (0.43) | TSHRALDH1A1MAPK1KDM4ELMNA | |
| SCHEMBL74478 | 0.81 | NPSR1 (0.54) | NPSR1TSHRALDH1A1SMN1; SMN2MAPK1 | |
| SCHEMBL5149611 | 0.80 | CHRNB2 (0.57) | TSHRALDH1A1MAOBMEN1KMT2A | |
| SCHEMBL8751741 | 0.78 | HTT (0.37) | TSHRALDH1A1SMN1; SMN2MAPK1KDM4E | |
| SCHEMBL2942427 | 0.78 | ALDH1A1 (0.37) | NPSR1HIF1AALDH1A1KDM4EMEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-6303264-B1 | PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY | WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) | 2001-10-16 | — | — | US | disclosed |
| EP-0675410-B1 | Resist composition for deep ultraviolet light | WAKO PURE CHEM IND LTD (JP) | 1999-08-04 | — | — | EP | disclosed |
| EP-0875787-A1 | Method for reducing the substrate dependence of resist | Wako Pure Chemical Industries, Ltd. (JP) | 1998-11-04 | — | — | EP | disclosed |
| US-5780206-A | USING AN ANTHRACENE DERIVATIVE AS AN ABSORBER ON HIGHLY REFLECTIVE SURFACES; ALKALI-SOLUBLE POLYMERS; GENERATION OF ACID CATALYSTS; FINE PATTERNS | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1998-07-14 | — | — | US | disclosed |
| US-5695910-A | RESIN BECOMES ALKALI SOLUBLE BY ELIMINATING PROTECTIVE GROUPS BY ACTION OF IN SITU GENERATED ACID | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-12-09 | — | — | US | disclosed |
| EP-0579420-B1 | Negative working resist material and pattern forming process | WAKO PURE CHEM IND LTD (JP) | 1997-03-05 | — | — | EP | disclosed |
| EP-0675410-A1 | Resist composition for deep ultraviolet light | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1995-10-04 | — | — | EP | disclosed |
| US-5389491-A | Negative working resist composition | MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) | 1995-02-14 | — | — | US | disclosed |
| EP-0579420-A2 | Negative working resist material and pattern forming process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1994-01-19 | — | — | EP | disclosed |