Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 5/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 2/20 | 0.46 |
| ▸ | HPGD | P15428 | 1/20 | 0.46 |
| ▸ | LMNA | P02545 | 1/20 | 0.45 |
| ▸ | HTT | P42858 | 1/20 | 0.45 |
| ▸ | MEN1 | O00255 | 1/20 | 0.44 |
| ▸ | NPC1 | O15118 | 1/20 | 0.44 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.44 |
| ▸ | RAB9A | P51151 | 1/20 | 0.44 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.44 |
| ▸ | CYP2A6 | P11509 | 3/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | HIF1A | Q16665 | 1/20 | 0.43 |
| ▸ | CYP1B1 | Q16678 | 1/20 | 0.43 |
| ▸ | PKM | P14618 | 1/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.41 |
| ▸ | LCK | P06239 | 1/20 | 0.41 |
| ▸ | FYN | P06241 | 1/20 | 0.41 |
| ▸ | ADORA3 | P0DMS8 | 1/20 | 0.41 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL30845731 | 1.00 | CYP1A2 (0.46) | CYP1A2ALDH1A1HSD17B10HPGDLMNA | |
| SCHEMBL23199043 | 0.84 | DYRK1A (0.49) | CYP1A2HSD17B10MEN1NPC1KMT2A | |
| Hydrochloric Acid SCHEMBL30153511 | 0.80 | CYP2A6 (0.60) | CYP1A2ALDH1A1HSD17B10LMNAHTT | |
| SCHEMBL15698104 | 0.80 | ALDH1A1 (0.40) | CYP1A2ALDH1A1HSD17B10HPGDLMNA | |
| SCHEMBL33727 | 0.80 | CYP2A6 (0.60) | CYP1A2ALDH1A1HSD17B10LMNAHTT | |
| SCHEMBL7122796 | 0.79 | LMNA (0.45) | CYP1A2ALDH1A1HSD17B10HPGDLMNA | |
| SCHEMBL82870 | 0.78 | PTPN22 (0.64) | CYP1A2ALDH1A1HSD17B10MEN1NPC1 | |
| SCHEMBL29726949 | 0.78 | CYP1A2 (0.64) | CYP1A2ALDH1A1HSD17B10HPGDRAB9A | |
| SCHEMBL29447273 | 0.78 | PTPN22 (0.64) | CYP1A2ALDH1A1HSD17B10MEN1NPC1 | |
| SCHEMBL25429187 | 0.78 | PTPN22 (0.64) | CYP1A2ALDH1A1HSD17B10MEN1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 23 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3823067-B1 | ORGANIC EXPANDER FOR LEAD STORAGE BATTERY | JUJO PAPER CO LTD (JP) | 2026-02-25 | — | — | EP | disclosed |
| EP-4682991-A1 | NEGATIVE ELECTRODE ADDITIVE, NEGATIVE ELECTRODE, AND SECONDARY BATTERY | Nippon Paper Industries Co., Ltd. (JP) | 2026-01-21 | — | — | EP | disclosed |
| WO-2025047011-A1 | COMPOSITION FOR NEGATIVE ELECTRODES, NEGATIVE ELECTRODE, AND SECONDARY BATTERY | 日本製紙株式会社 | 2025-03-06 | — | — | WO | disclosed |
| WO-2025009241-A1 | COMPOSITION FOR NEGATIVE ELECTRODE, NEGATIVE ELECTRODE, AND SECONDARY BATTERY | 日本製紙株式会社 | 2025-01-09 | — | — | WO | disclosed |
| WO-2024189952-A1 | NEGATIVE ELECTRODE ADDITIVE, NEGATIVE ELECTRODE, AND SECONDARY BATTERY | 日本製紙株式会社 | 2024-09-19 | — | — | WO | disclosed |
| US-11251434-B2 | Organic expander for lead storage battery | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2022-02-15 | — | — | US | disclosed |
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-09-28 | — | — | US | disclosed |
| EP-3823067-A1 | ORGANIC ANTI-SHRINKAGE AGENT FOR LEAD STORAGE BATTERY | Nippon Paper Industries Co., Ltd. (JP) | 2021-05-19 | — | — | EP | disclosed |
| US-20210047457-A1 | COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-02-18 | — | — | US | disclosed |
| EP-3744710-A1 | COMPOUND, RESIN, COMPOSITION, AND PATTERN FORMING METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2020-12-02 | — | — | EP | disclosed |
| US-20190010108-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2019-01-10 | — | — | US | disclosed |
| EP-3395845-A1 | COMPOUND, RESIN, COMPOSITION, METHOD FOR FORMING RESIST PATTERN, AND METHOD FOR FORMING CIRCUIT PATTERN | Mitsubishi Gas Chemical Company, Inc. (JP) | 2018-10-31 | — | — | EP | disclosed |
| EP-2436837-B1 | METHOD FOR DIGESTING LIGNOCELLULOSIC MATERIAL | JUJO PAPER CO LTD (JP) | 2018-09-19 | — | — | EP | disclosed |
| US-20170369598-A1 | METHOD FOR PRODUCING XYLAN-CONTAINING MATERIAL | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2017-12-28 | — | — | US | disclosed |
| EP-3252083-A1 | METHOD FOR PRODUCING XYLAN-CONTAINING MATERIAL | Nippon Paper Industries Co., Ltd. (JP) | 2017-12-06 | — | — | EP | disclosed |
| US-9145642-B2 | Cooking process of lignocellulose material | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2015-09-29 | — | — | US | disclosed |
| US-20120067533-A1 | COOKING PROCESS OF LIGNOCELLULOSE MATERIAL | SURGICAL INNOVATIONS V.O.F. (NL) | 2012-03-22 | — | — | US | disclosed |
| EP-1245723-B1 | METHOD FOR RECOVERING CHEMICALS IN A PROCESS OF PRODUCING PULP BY KRAFT PROCESS | KAWASAKI KASEI CHEMICALS (JP) | 2008-11-05 | — | — | EP | disclosed |
| US-6585880-B1 | Method for recovering chemicals in a process of producing pulp by kraft process | NIPPON PAPER INDUSTRIES CO., LTD. (JP) | 2003-07-01 | — | — | US | disclosed |
| EP-1245723-A1 | METHOD FOR RECOVERING CHEMICALS IN A PROCESS OF PRODUCING PULP BY KRAFT PROCESS | Kawasaki Kasei Chemicals Ltd. (JP) | 2002-10-02 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20190010108-A1 | COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD, AND CIRCUIT PATTERN FORMATION METHOD | RER1, NBAS, INTS9 | CYP1A2 2085/4885ALDH1A1 1644/4885HSD17B10 552/4885 |
| US-11130724-B2 | Compound, resin, composition, resist pattern formation method, and circuit pattern formation method | RER1, NBAS, INTS9 | CYP1A2 2085/4885ALDH1A1 1644/4885HSD17B10 552/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.