Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR1 | P03372 | 8/20 | 0.56 |
| ▸ | ESR2 | Q92731 | 4/20 | 0.56 |
| ▸ | CYP3A4 | P08684 | 4/20 | 0.50 |
| ▸ | HSD17B10 | Q99714 | 4/20 | 0.50 |
| ▸ | ALOX15 | P16050 | 4/20 | 0.50 |
| ▸ | MEN1 | O00255 | 4/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.50 |
| ▸ | LMNA | P02545 | 3/20 | 0.50 |
| ▸ | MAPT | P10636 | 3/20 | 0.50 |
| ▸ | HIF1A | Q16665 | 3/20 | 0.50 |
| ▸ | NPC1 | O15118 | 2/20 | 0.50 |
| ▸ | TYR | P14679 | 2/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.50 |
| ▸ | NFKB1 | P19838 | 2/20 | 0.50 |
| ▸ | RAB9A | P51151 | 2/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.50 |
| ▸ | CA3 | P07451 | 2/20 | 0.50 |
| ▸ | CA14 | Q9ULX7 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.50 |
| ▸ | CA12 | O43570 | 1/20 | 0.50 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL13385395 | 0.92 | ESR1 (0.58) | ESR1ESR2CYP3A4HSD17B10ALOX15 | |
| SCHEMBL586534 | 0.83 | NR1H2 (0.50) | ESR1ESR2HPGDNR1H2NR1H3 | |
| 4-Vinylphenol SCHEMBL20515239 | 0.82 | ALDH1A1 (0.46) | ESR1ESR2MAPTALDH1A1KDM4E | |
| SCHEMBL18816092 | 0.82 | APP (0.64) | ESR1ESR2CYP3A4HSD17B10ALOX15 | |
| SCHEMBL2144488 | 0.81 | ESR1 (0.56) | ESR1ESR2CYP3A4HSD17B10ALOX15 | |
| SCHEMBL834965 | 0.81 | ESR1 (0.80) | ESR1ESR2CYP3A4HSD17B10ALOX15 | |
| SCHEMBL18691997 | 0.79 | ESR1 (0.54) | ESR1ESR2CYP3A4HSD17B10ALOX15 | |
| SCHEMBL14163946 | 0.77 | ESR1 (0.52) | ESR1ESR2CYP3A4HSD17B10ALOX15 | |
| SCHEMBL11979357 | 0.75 | NR1H2 (0.46) | ESR1ESR2HPGDNR1H2NR1H3 | |
| SCHEMBL132491 | 0.75 | ESR1 (0.50) | ESR1ESR2CYP3A4HSD17B10ALOX15 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-118932605-A | Ultrathin ceramic nanofiber membrane for electronic heat management and preparation method thereof | 嘉兴富瑞邦新材料科技有限公司 | 2024-11-12 | — | — | CN | claimed |
| CN-118301847-A | Flame-retardant high-performance epoxy resin copper-clad plate and preparation method thereof | 吉林省大顶山寰川新材料有限公司 | 2024-07-05 | — | — | CN | claimed |
| CN-118126728-A | Composite surfactant and preparation method and application thereof | 上海优创化学品有限公司 | 2024-06-04 | — | — | CN | claimed |
| CN-117903345-A | Catalyst system containing trialkyl silicon-based phenol compound and preparation and application thereof | 中国石油化工股份有限公司 | 2024-04-19 | — | — | CN | claimed |
| CN-112226082-A | Membrane material for communication based on 5G and preparation method thereof | 合肥坤擎机械科技有限公司 | 2021-01-15 | — | — | CN | claimed |
| EP-0735425-B1 | Esterification product of aromatic novolak resin with quinone diazide sulfonyl compound | SHIPLEY CO LLC (US) | 2003-06-04 | — | — | EP | claimed |
| EP-0875793-B1 | Toner for developing electrostatic images | CANON KK (JP) | 2001-10-10 | — | — | EP | claimed |
| US-5972554-A | COMPRISING A PHENOL-ALDEHYDE CONDENSATE RESIN, EXHIBIT A GOOD DISPERSIBILITY IN THE BINDER RESIN AND A GOOD CHARGE CONTROL PERFORMANCE | CANON KABUSHIKI KAISHA (JP) | 1999-10-26 | — | — | US | claimed |
| EP-0737895-B1 | Photoresist with photoactive compound mixtures | SHIPLEY CO LLC (US) | 1999-09-08 | — | — | EP | claimed |
| EP-0875793-A2 | Toner for developing electrostatic images | CANON KABUSHIKI KAISHA (JP) | 1998-11-04 | — | — | EP | claimed |
| US-5723254-A | NOVOLAK ESTERIFIED WITH O-NAPHTHOQUINONE DIAZIDE | SHIPLEY COMPANY, L.L.C. (US) | 1998-03-03 | — | — | US | claimed |
| US-5589553-A | PHOTORESISTS | SHIPLEY COMPANY, L.L.C. (US) | 1996-12-31 | — | — | US | claimed |
| EP-0737895-A1 | Photoresist with photoactive compound mixtures | Shipley Company LLC (US) | 1996-10-16 | — | — | EP | claimed |
| EP-0735425-A2 | Esterification product of aromatic novolak resin with quinone diazide sulfonyl compound | Shipley Company LLC (US) | 1996-10-02 | — | — | EP | claimed |
| US-5419995-A | Photoresist composition with alternating or block copolymer resins and positive-working o-quinone diazide or negative-working azide sensitizer compound | SHIPLEY COMPANY INC. (US) | 1995-05-30 | — | — | US | claimed |
| US-5238776-A | Improved thermal properties, etch resistance, high speed | SHIPLEY COMPANY INC. (US) | 1993-08-24 | — | — | US | claimed |
| US-5130410-A | Condencing a bishydroxymethyl phenol with a reactive phenol in the absence of an aldehyde to form an alternating copolymer and reacting in the presence of an aromatic aldehyde | SHIPLEY COMPANY INC. (US) | 1992-07-14 | — | — | US | claimed |
| JP-63292129-A | — | — | None | — | — | JP | disclosed |
| US-4105648-A | CROSSLINKED POLYACRYLAMIDES CONTAINING SILYL GROUPS | CIBA-GEIGY CORPORATION (US) | 1978-08-08 | — | — | US | disclosed |
| US-4000265-A | SILICON COMPOUNDS | SOCIETE CORTIAL (FR) | 1976-12-28 | — | — | US | disclosed |