SCHEMBL834965

SCHEMBL834965

C[Si](C)(c1ccc(O)cc1)c1ccc(O)cc1

nearest known ligand 0.80

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 8/20 0.80
ESR2 Q92731 4/20 0.80
CYP3A4 P08684 4/20 0.50
HSD17B10 Q99714 4/20 0.50
ALOX15 P16050 4/20 0.50
HPGD P15428 3/20 0.50
MEN1 O00255 3/20 0.50
LMNA P02545 3/20 0.50
MAPT P10636 3/20 0.50
KMT2A Q03164 3/20 0.50
HIF1A Q16665 3/20 0.50
NPC1 O15118 2/20 0.50
TYR P14679 2/20 0.50
NFKB1 P19838 2/20 0.50
RAB9A P51151 2/20 0.50
ALDH1A1 P00352 2/20 0.50
CA3 P07451 2/20 0.50
CA14 Q9ULX7 2/20 0.50
KDM4E B2RXH2 1/20 0.50
CA12 O43570 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2144488 0.81 ESR1 (0.56) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL78718 0.81 ESR1 (0.56) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL18691997 0.79 ESR1 (0.54) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL14163946 0.77 ESR1 (0.52) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL13385395 0.75 ESR1 (0.58) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL132491 0.75 ESR1 (0.50) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL2542879 0.73 ALOX15 (0.57) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL2622739 0.73 ESR1 (0.62) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL22888814 0.73 ESR1 (0.74) ESR1ESR2CYP3A4HSD17B10ALOX15
SCHEMBL6890463 0.73 ESR1 (0.48) ESR1ESR2CYP3A4HSD17B10ALOX15

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 216 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122037164-A Polyaryletherketone sequence copolymer, preparation method thereof and application thereof in 3D printing 吉林大学 2026-05-15 CN claimed
CN-116144029-B Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device 阜阳欣奕华新材料科技股份有限公司 2025-03-18 CN claimed
CN-116144029-A Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device 阜阳欣奕华材料科技有限公司 2023-05-23 CN claimed
CN-107629082-B A kind of novel siliceous benzoxazine and preparation method thereof 西南石油大学 2019-11-22 CN claimed
EP-0220080-B1 COMPOSITIONS BASED ON PHTHALONITRILE-TERMINATED POLYARYLOXY PYRIDINE OLIGOMERS, THEIR PREPARATION, THEIR USE IN THE PREPARATION OF POLYARYLOXY PYRIDINE COPHTHALOCYANINE LATTICES AND LATTICES OBTAINED CENTRE D'ETUDE DES MATERIAUX ORGANIQUES POUR TECHNOLOGIES AVANCEES (FR) 1990-02-07 EP claimed
US-4871816-A Triblock polyarylene polyether with polysiloxane segment and impact-improved blends thereof THE B.F. GOODRICH COMPANY (US) 1989-10-03 US claimed
US-4764578-A Compositions of polyaryloxypyridine oligomers with phthalonitrile end groups, their preparation and use for manufacturing polyaryloxypyridine co-phthalocyanine lattices CENTRE D'ETUDE DES MATERIAUX ORGANIQUES POUR TECHNOLOGIES AVANCEES (FR) 1988-08-16 US claimed
CN-122072433-A Photosensitive resin composition for black resist, method for producing resin composition, light-shielding film, optical filter, touch panel, and display device 日铁化学材料株式会社 2026-05-22 CN disclosed
CN-122037164-A Polyaryletherketone sequence copolymer, preparation method thereof and application thereof in 3D printing 吉林大学 2026-05-15 CN disclosed
CN-113050372-B Photosensitive resin composition for black resist, light shielding film, color filter, touch panel, and display device 日铁化学材料株式会社 2026-05-12 CN disclosed
CN-111748077-B Alkali-soluble resin, hydrogenated compound, method for producing same, resin composition, cured film thereof, touch panel, and optical filter 日铁化学材料株式会社 2025-04-18 CN disclosed
CN-112162462-B Photosensitive resin composition for touch screen, cured film thereof, and touch screen having cured film thereof 日铁化学材料株式会社 2025-04-08 CN disclosed
CN-116144029-B Organosilicon leveling agent, preparation method thereof, black matrix photosensitive resin composition, color filter and liquid crystal display device 阜阳欣奕华新材料科技股份有限公司 2025-03-18 CN disclosed
US-5710234-A POLYORTHOESTERS FOR MOLDING MATERIALS, ADHESIVES AND HEAT RESISTANT POLYMERS NIPPON STEEL CHEMICAL CO., LTD. (JP) 1998-01-20 US disclosed
EP-0710885-A1 Radiation sensitive composition HOECHST JAPAN LIMITED (JP) 1996-05-08 EP disclosed
EP-0646845-A1 COLOR FILTER, MATERIAL THEREOF AND RESIN Nippon Steel Corporation (JP) 1995-04-05 EP disclosed
US-5200290-A Liquid developers containing colored polymers with a color chromophore covalently bound thereto XEROX CORPORATION (US) 1993-04-06 US disclosed
US-4814403-A CROSSLINKING-HEAT, OXIDATION RESISTANCE CENTRE D'ETUDE DES MATERIAUX ORGANIQUES POUR TECHNOLOGIES AVANCEES (FR) 1989-03-21 US disclosed
US-4764578-A Compositions of polyaryloxypyridine oligomers with phthalonitrile end groups, their preparation and use for manufacturing polyaryloxypyridine co-phthalocyanine lattices CENTRE D'ETUDE DES MATERIAUX ORGANIQUES POUR TECHNOLOGIES AVANCEES (FR) 1988-08-16 US disclosed
US-4645727-A Colored toner compositions comprising dye chromophores XEROX CORPORATION (US) 1987-02-24 US disclosed