SCHEMBL7893115

SCHEMBL7893115

O=S(=O)(CCCS(=O)(=O)CS(=O)(=O)c1ccccc1)CS(=O)(=O)c1ccccc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PSIP1 O75475 1/20 0.52
CA2 P00918 2/20 0.47
HDAC3 O15379 1/20 0.46
HDAC4 P56524 1/20 0.46
HDAC1 Q13547 1/20 0.46
HDAC7 Q8WUI4 1/20 0.46
HDAC2 Q92769 1/20 0.46
HDAC10 Q969S8 1/20 0.46
HDAC11 Q96DB2 1/20 0.46
HDAC8 Q9BY41 1/20 0.46
HDAC6 Q9UBN7 1/20 0.46
HDAC9 Q9UKV0 1/20 0.46
HDAC5 Q9UQL6 1/20 0.46
HSD11B1 P28845 3/20 0.44
ALDH1A1 P00352 3/20 0.44
KDM4E B2RXH2 1/20 0.44
LMNA P02545 1/20 0.44
PKM P14618 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
KEAP1 Q14145 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10629823 0.81 PSIP1 (0.61) PSIP1CA2HDAC3HDAC4HDAC1
SCHEMBL64761 0.81 PSIP1 (0.67) PSIP1CA2HDAC3HDAC4HDAC1
SCHEMBL10626503 0.79 HDAC1 (0.65) PSIP1CA2HDAC3HDAC4HDAC1
SCHEMBL576918 0.77 KEAP1 (0.63) PSIP1CA2HDAC3HDAC4HDAC1
SCHEMBL777601 0.76 PSIP1 (0.67) PSIP1CA2HDAC3HDAC4HDAC1
SCHEMBL11815895 0.73 PSIP1 (0.56) PSIP1CA2HSD11B1ALDH1A1KDM4E
SCHEMBL6544145 0.73 PSIP1 (0.62) PSIP1CA2HSD11B1ALDH1A1KDM4E
SCHEMBL5013934 0.73 PSIP1 (0.56) PSIP1HDAC3HDAC4HDAC1HDAC7
SCHEMBL15301816 0.73 CA2 (0.63) PSIP1CA2HSD11B1ALDH1A1KDM4E
SCHEMBL7295494 0.72 HDAC1 (0.57) PSIP1CA2HDAC3HDAC4HDAC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6180313-B1 SUITABLE AS RADIATION-SENSITIVE ACID-GENERATING AGENT; PHOTORESISTS FOR USE IN PHOTOLITHOGRAPHY TOKYO OHKA KOGYO CO., LTD. (JP) 2001-01-30 US disclosed
US-6153733-A (Disulfonyl diazomethane compounds) TOKYO OHKA KOGYO CO., LTD. (JP) 2000-11-28 US disclosed