SCHEMBL790380

SCHEMBL790380

C=CCS(CC=C)(CC=C)Cc1ccccc1

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA1 P00915 2/20 0.41
CA2 P00918 2/20 0.41
PRSS1 P07477 2/20 0.41
PRSS2 P07478 2/20 0.41
PRSS3 P35030 2/20 0.41
FAAH O00519 1/20 0.41
ELANE P08246 1/20 0.41
PRTN3 P24158 1/20 0.41
CA5A P35218 1/20 0.41
CA9 Q16790 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.39
LOXL2 Q9Y4K0 1/20 0.39
MMP1 P03956 1/20 0.38
MMP2 P08253 1/20 0.38
MMP9 P14780 1/20 0.38
MMP8 P22894 1/20 0.38
MMP13 P45452 1/20 0.38
MAOB P27338 1/20 0.37
KMT2A Q03164 1/20 0.36
CALM1 P0DP23 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6555604 0.78 CA1 (0.48) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL19620709 0.78 CA1 (0.39) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL9651707 0.78 CA1 (0.39) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL3997489 0.77 PRSS1 (0.55) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL24508468 0.69 CA1 (0.52) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL1879853 0.68 CA2 (0.52) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL2689672 0.68 CA2 (0.52) CA1CA2PRSS1PRSS2PRSS3
SCHEMBL8962569 0.68 CA1 (0.41) CA1CA2PRSS1PRSS2PRSS3
Allylbenzene SCHEMBL10325179 0.67 MAOB (0.60) CA1CA2SMN1; SMN2LOXL2MAOB
Allylbenzene SCHEMBL21274 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 33 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11884839-B2 Acetal-protected silanol group-containing polysiloxane composition NISSAN CHEMICAL CORPORATION (JP) 2024-01-30 US disclosed
US-10845703-B2 Film-forming composition containing silicone having crosslinking reactivity NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-11-24 US disclosed
US-10838303-B2 Resist underlayer film forming composition for lithography containing hydrolyzable silane having carbonate skeleton NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-11-17 US disclosed
US-10613440-B2 Silicon-containing EUV resist underlayer film-forming composition containing onium sulfonate NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2020-04-07 US disclosed
US-10372039-B2 Resist underlayer film forming composition containing silicon having ester group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-08-06 US disclosed
US-10372040-B2 Resist underlayer film forming composition for lithography containing hydrolyzable silane having halogen-containing carboxylic acid amide group NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-08-06 US disclosed
US-20190185707-A1 ACETAL-PROTECTED SILANOL GROUP-CONTAINING POLYSILOXANE COMPOSITION NISSAN CHEMICAL CORPORATION (JP) 2019-06-20 US disclosed
US-10139729-B2 Coating composition for pattern reversal on soc pattern NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-11-27 US disclosed
US-20180335698-A1 FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING REACTIVITY NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-11-22 US disclosed
US-20180239250-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING HYDROLYZABLE SILANE HAVING CARBONATE SKELETON NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-08-23 US disclosed
US-9023588-B2 Resist underlayer film forming composition containing silicon having nitrogen-containing ring NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-05-05 US disclosed
US-20150118396-A1 UNDERLAYER FILM-FORMING COMPOSITION FOR SELF-ASSEMBLED FILMS NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-04-30 US disclosed
EP-2832807-A1 UNDERLAYER FILM FORMING COMPOSITION FOR SELF-ASSEMBLED FILMS Nissan Chemical Industries, Ltd. (JP) 2015-02-04 EP disclosed
US-20140377957-A1 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SILICON-CONTAINING RESIST UNDERLAYER FILM FORMING COMPOSITION FOR SOLVENT DEVELOPMENT NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-12-25 US disclosed
US-20140170855-A1 SILICON-CONTAINING RESIST UNDERLAYER FILM-FORMING COMPOSITION HAVING SULFONE STRUCTURE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-06-19 US disclosed
EP-2735904-A1 THIN FILM FORMATION COMPOSITION FOR LITHOGRAPHY WHICH CONTAINS TITANIUM AND SILICON Nissan Chemical Industries, Ltd. (JP) 2014-05-28 EP disclosed
US-20140120730-A1 THIN FILM FORMING COMPOSITION FOR LITHOGRAPHY CONTAINING TITANIUM AND SILICON NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2014-05-01 US disclosed
EP-2538276-A1 COMPOSITION FOR FORMATION OF RESIST UNDERLAYER FILM CONTAINING SILICON HAVING NITROGEN-CONTAINING RING Nissan Chemical Industries, Ltd. (JP) 2012-12-26 EP disclosed
US-20120315765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-12-13 US disclosed
US-20120070994-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2012-03-22 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (4 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120315765-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING SRSF1, SRSF7, SRRM2 CA1 692/4885CA2 1566/4885PRSS1 127/4885
US-20120070994-A1 RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING SULFIDE BOND SMC3, SRSF3, SRSF9 CA1 356/4885CA2 1558/4885PRSS1 573/4885
US-10845703-B2 Film-forming composition containing silicone having crosslinking reactivity SETDB1, KDM2B, SRSF9 CA1 382/4885CA2 2417/4885PRSS1 488/4885
US-20180335698-A1 FILM-FORMING COMPOSITION CONTAINING SILICONE HAVING CROSSLINKING REACTIVITY SETDB1, KDM2B, CD79B CA1 331/4885CA2 2128/4885PRSS1 366/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.