SCHEMBL7915293

SCHEMBL7915293

CC(C)C(=O)OCCN(C(N)=O)c1cc([N+](=O)[O-])cc([N+](=O)[O-])c1

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 2/20 0.39
CYP3A4 P08684 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.36
ATM Q13315 1/20 0.36
NPC1 O15118 1/20 0.36
HTT P42858 2/20 0.35
POLB P06746 1/20 0.35
ALDH1A1 P00352 1/20 0.34
MEN1 O00255 2/20 0.33
LMNA P02545 2/20 0.33
KMT2A Q03164 2/20 0.33
MAPT P10636 1/20 0.33
MAPK1 P28482 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
MLYCD O95822 1/20 0.33
ITGA4 P13612 1/20 0.32
ITGB7 P26010 1/20 0.32
CYP1A2 P05177 1/20 0.32
CYP2D6 P10635 1/20 0.32
ALOX15 P16050 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7916515 0.80 MAOA (0.34) LMNACYP1A2CYP2D6TSHR
SCHEMBL7918653 0.78 CYP3A4 (0.47) SMN1; SMN2CYP3A4ATMHTTPOLB
SCHEMBL7908561 0.72 NPC1 (0.54) SMN1; SMN2CYP3A4L3MBTL1ATMNPC1
SCHEMBL7918663 0.69 MAPT (0.46) SMN1; SMN2NPC1HTTALDH1A1MEN1
SCHEMBL7915297 0.67 KMT2A (0.47) SMN1; SMN2HTTPOLBALDH1A1MEN1
SCHEMBL7512104 0.64 NPC1 (0.54) SMN1; SMN2CYP3A4L3MBTL1ATMNPC1
SCHEMBL692306 0.63 ALDH1A1 (0.48) CYP3A4L3MBTL1ATMNPC1ALDH1A1
SCHEMBL29750252 0.62 CYP3A4 (0.42) SMN1; SMN2CYP3A4L3MBTL1NPC1HTT
SCHEMBL3423118 0.62 HTR2A (0.61) SMN1; SMN2CYP3A4L3MBTL1NPC1ALDH1A1
SCHEMBL4623730 0.61 SMN1; SMN2 (0.49) SMN1; SMN2CYP3A4L3MBTL1NPC1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6200831-B1 HEAT-CURING A COATING OF A POLYAMIC ACID BASED ON A TETRACARBOXYLIC ACID AND A DIAMINE CONTAINNG AN ACTIVE OXYGEN OR NITROGEN FUNCTIONAL GROUP; SEALING THE EXTERNAL TERMINALS WITH A RESIN, E.G. AN EPOXIDE HITACHI, LTD. (JP) 2001-03-13 US disclosed
US-6087006-A SEMICONDUCTOR DEVICE HAVING SURFACE-PROTECTING FILM COMPRISING POLYIMIDE OBTAINED BY HEAT-CURING PRECURSOR HAVING POLAR SUBSTITUENTS AS THE SIDE CHAINS HITACHI, LTD. (JP) 2000-07-11 US disclosed