SCHEMBL7919904

SCHEMBL7919904

Oc1ccccc1C1(c2ccccc2)CCc2ccccc2O1

nearest known ligand 0.43

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
HCAR2 Q8TDS4 1/20 0.43
LDHA P00338 1/20 0.40
LDHB P07195 1/20 0.40
SIGMAR1 Q99720 1/20 0.40
TRPM8 Q7Z2W7 1/20 0.39
HDAC9 Q9UKV0 1/20 0.38
DRD2 P14416 1/20 0.38
HTR2A P28223 1/20 0.38
EPHX2 P34913 2/20 0.34
EPHX1 P07099 1/20 0.33
KDM1A O60341 2/20 0.33
OPRM1 P35372 1/20 0.32
OPRD1 P41143 1/20 0.32
TSHR P16473 1/20 0.32
TDP1 Q9NUW8 1/20 0.32
MAOB P27338 1/20 0.32
BCL2L1 Q07817 1/20 0.32
BAD Q92934 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28338443 0.87 LDHA (0.38) HCAR2LDHALDHBSIGMAR1HDAC9
SCHEMBL28633081 0.86 HCAR2 (0.39) HCAR2LDHALDHBSIGMAR1TRPM8
SCHEMBL9113086 0.85 SIGMAR1 (0.46) HCAR2SIGMAR1TRPM8HDAC9DRD2
SCHEMBL5885410 0.77 SIGMAR1 (0.40) HCAR2SIGMAR1TRPM8HDAC9DRD2
SCHEMBL3285647 0.76 SIGMAR1 (0.39) HCAR2SIGMAR1TRPM8DRD2HTR2A
SCHEMBL30685308 0.74 SIGMAR1 (0.38) HCAR2SIGMAR1TRPM8DRD2HTR2A
SCHEMBL1246125 0.72 SIGMAR1 (0.44) HCAR2SIGMAR1TRPM8HDAC9DRD2
SCHEMBL16150372 0.72 SIGMAR1 (0.36) HCAR2SIGMAR1TRPM8DRD2HTR2A
SCHEMBL28400798 0.71 SIGMAR1 (0.43) HCAR2SIGMAR1TRPM8HDAC9DRD2
SCHEMBL11274144 0.70 SIGMAR1 (0.42) HCAR2SIGMAR1TRPM8DRD2HTR2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 19 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0633499-A1 Radiation sensitive resist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-01-11 EP claimed
US-11681227-B2 Enhanced EUV photoresist materials, formulations and processes IRRESISTIBLE MATERIALS LTD (GB) 2023-06-20 US disclosed
CN-113994256-A Method for forming EUV patterned resist 亚历克斯·P·G·罗宾逊 2022-01-28 CN disclosed
US-20200272050-A1 Enhanced EUV Photoresist Materials, Formulations and Processes IRRESISTIBLE MATERIALS, LTD (GB) 2020-08-27 US disclosed
CN-110998437-A Multi-trigger photoresist compositions and methods A·P·G·罗宾森 2020-04-10 CN disclosed
US-10095112-B2 Multiple trigger photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2018-10-09 US disclosed
US-20180246408-A1 MULTIPLE TRIGGER PHOTORESIST COMPOSITIONS AND METHODS IRRESISTIBLE MATERIALS, LTD (GB) 2018-08-30 US disclosed
US-9519215-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS, LTD (GB) 2016-12-13 US disclosed
US-20160246173-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-08-25 US disclosed
US-9383646-B2 Two-step photoresist compositions and methods IRRESISTIBLE MATERIALS LTD (GB) 2016-07-05 US disclosed
US-9229322-B2 Composition of matter and molecular resist made therefrom IRRESISTIBLE MATERIALS LTD (GB) 2016-01-05 US disclosed
EP-2920142-A1 METHANOFULLERENES Robinson, Alex Philip, Graham (GB) 2015-09-23 EP disclosed
US-20150241773-A1 Two-Step Photoresist Compositions and Methods IRRESISTIBLE MATERIALS LTD (GB) 2015-08-27 US disclosed
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom IRRESISTIBLE MATERIALS LTD (GB) 2015-05-21 US disclosed
WO-2014137663-A1 METHANOFULLERENES ROBINSON ALEX PHILIP GRAHAM (GB) 2014-09-12 WO disclosed
WO-2014078097-A1 METHANOFULLERENES ROBINSON ALEX PHILIP GRAHAM (GB) 2014-05-22 WO disclosed
US-RE37179-E1 ADDITION POLYMER JSR CORPORATION (JP) 2001-05-15 US disclosed
US-5413896-A Light sensitive element with novolak resin and quinonediazide compounds JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-05-09 US disclosed
EP-0633499-A1 Radiation sensitive resist composition JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1995-01-11 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-10095112-B2 Multiple trigger photoresist compositions and methods ERCC4, ERCC2, APEX1 HCAR2 2338/4885LDHA 3456/4885LDHB 3776/4885
US-20150140489-A1 Composition of Matter and Molecular Resist Made Therefrom HNRNPM, TUFM, MSR1 HCAR2 1803/4885LDHA 1725/4885LDHB 2970/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.