SCHEMBL7974023

SCHEMBL7974023

Cc1ccc2oc(Cl)[c]c2c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NOS1 P29475 2/20 0.40
NOS3 P29474 1/20 0.40
NOS2 P35228 1/20 0.40
ALDH1A1 P00352 3/20 0.37
MAPT P10636 3/20 0.35
HTT P42858 1/20 0.35
MAOB P27338 5/20 0.34
KDM4E B2RXH2 4/20 0.34
HPGD P15428 3/20 0.34
SMN1; SMN2 Q16637 3/20 0.34
TP53 P04637 2/20 0.34
NPC1 O15118 2/20 0.34
RAB9A P51151 2/20 0.34
HSD17B10 Q99714 1/20 0.34
LMNA P02545 1/20 0.34
NFKB1 P19838 1/20 0.34
NFKB2 Q00653 1/20 0.34
RELA Q04206 1/20 0.34
CSNK2A2 P19784 1/20 0.33
CSNK2B P67870 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7974028 0.83 HSD17B10 (0.37) NOS1NOS3NOS2ALDH1A1MAPT
SCHEMBL4460823 0.71 AHR (0.38) ALDH1A1MAPTKDM4EHPGDSMN1; SMN2
SCHEMBL7976274 0.69 LMNA (0.40) NOS1NOS3NOS2ALDH1A1MAPT
SCHEMBL2056670 0.69 CYP1A2 (0.33) MAPTKDM4ESMN1; SMN2TP53HSD17B10
SCHEMBL11028225 0.65 CYP3A4 (0.37) ALDH1A1MAOBKDM4EHPGDSMN1; SMN2
SCHEMBL11025889 0.65 CYP3A4 (0.37) ALDH1A1MAOBKDM4EHPGDSMN1; SMN2
SCHEMBL11026596 0.64 CYP2A6 (0.43) NOS1NOS3NOS2ALDH1A1MAPT
SCHEMBL13824711 0.64 ALDH1A1 (0.52) ALDH1A1MAOBADORA3CYP1A2CYP2A6
SCHEMBL209082 0.64 ALDH1A1 (0.34) NOS1NOS3NOS2ALDH1A1MAOB
SCHEMBL11826319 0.64 CYP2A6 (0.44) ALDH1A1MAPTKDM4EHPGDHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268514-B1 TREATING INDUSTRIAL MATERIALS WITH NITROETHANE COMPOUND FOR PROTECTING AGAINST ATTACK AND DESTRUCTION BY MICROORGANISMS BASF AKTIENGESELLSCHAFT (DE) 2001-07-31 US disclosed