SCHEMBL7976274

SCHEMBL7976274

Cc1[c]c2cc(Cl)ccc2o1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 4/20 0.40
KDM4E B2RXH2 2/20 0.40
ALDH1A1 P00352 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
HPGD P15428 1/20 0.40
NFKB1 P19838 1/20 0.40
NFKB2 Q00653 1/20 0.40
RELA Q04206 1/20 0.40
CASP3 P42574 2/20 0.38
SENP7 Q9BQF6 2/20 0.38
SENP6 Q9GZR1 2/20 0.38
NPC1 O15118 1/20 0.38
RAB9A P51151 1/20 0.38
SENP8 Q96LD8 1/20 0.38
MCL1 Q07820 2/20 0.38
AHR P35869 7/20 0.37
CYP1A2 P05177 2/20 0.35
MAOB P27338 2/20 0.35
MAPT P10636 1/20 0.35
THRB P10828 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7976280 0.86 AHR (0.39) LMNAKDM4EALDH1A1SMN1; SMN2HPGD
SCHEMBL28431735 0.76 CYP2A6 (0.38) LMNAKDM4ESMN1; SMN2AHRMAOB
SCHEMBL7974023 0.69 NOS1 (0.40) LMNAKDM4EALDH1A1SMN1; SMN2HPGD
SCHEMBL29210392 0.69 GABRA1 (0.39) LMNANFKB1MAOBMAPTTSHR
SCHEMBL2056670 0.68 CYP1A2 (0.33) LMNAKDM4ESMN1; SMN2CYP1A2MAPT
SCHEMBL11030089 0.65 TP53 (0.43) LMNAALDH1A1SMN1; SMN2HPGDAHR
SCHEMBL10745593 0.64 POLB (0.43) LMNAKDM4EALDH1A1SMN1; SMN2MCL1
SCHEMBL11028225 0.64 CYP3A4 (0.37) LMNAKDM4EALDH1A1SMN1; SMN2HPGD
SCHEMBL11025889 0.64 CYP3A4 (0.37) LMNAKDM4EALDH1A1SMN1; SMN2HPGD
SCHEMBL434464 0.63 MAOB (0.55) LMNAKDM4EALDH1A1SMN1; SMN2HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6268514-B1 TREATING INDUSTRIAL MATERIALS WITH NITROETHANE COMPOUND FOR PROTECTING AGAINST ATTACK AND DESTRUCTION BY MICROORGANISMS BASF AKTIENGESELLSCHAFT (DE) 2001-07-31 US disclosed