SCHEMBL799424

SCHEMBL799424

C=CC(=O)NCC(C)CC

nearest known ligand 0.48

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
TSHR P16473 4/20 0.48
ALDH1A1 P00352 2/20 0.48
MAPK1 P28482 1/20 0.48
TDP1 Q9NUW8 1/20 0.48
ZDHHC20 Q5W0Z9 1/20 0.46
ZDHHC2 Q9UIJ5 1/20 0.46
CNR2 P34972 4/20 0.44
CNR1 P21554 3/20 0.44
FAAH O00519 1/20 0.44
TGM2 P21980 1/20 0.34
CYP2D6 P10635 1/20 0.32
CYP2C19 P33261 1/20 0.32
HRH4 Q9H3N8 1/20 0.32
HRH3 Q9Y5N1 1/20 0.32
PPARG P37231 2/20 0.32
PPARD Q03181 2/20 0.32
PPARA Q07869 2/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18755013 0.89 TSHR (0.54) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL17183770 0.84 ZDHHC20 (0.47) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL29531590 0.83 TSHR (0.48) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL8525778 0.82 TSHR (0.46) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL2125085 0.81 TSHR (0.50) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL8433552 0.81 CNR2 (0.45) TSHRCNR2CNR1FAAHCYP2D6
SCHEMBL17183684 0.81 TSHR (0.50) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL372689 0.80
SCHEMBL24652900 0.80 TSHR (0.45) TSHRALDH1A1MAPK1TDP1ZDHHC20
SCHEMBL7719555 0.80 TSHR (0.45) TSHRALDH1A1MAPK1TDP1ZDHHC20

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 62 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113493652-B Abrasive composition 山口精研工业株式会社 2024-05-28 CN disclosed
CN-117986441-A Oil displacement agent for improving recovery ratio of low-permeability sensitive heavy oil reservoir and preparation method thereof 中国石油化工股份有限公司 2024-05-07 CN disclosed
WO-2024085570-A1 FLUORINE-BASED POLYMER AND METHOD FOR PREPARING SAME 한국화학연구원 2024-04-25 WO disclosed
US-11492432-B2 Resin for nanoimprinting, laminate containing resin for nanoimprinting, printed board containing resin for nanoimprinting, and method for producing nanoimprint substrate JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2022-11-08 US disclosed
US-20220133711-A1 CAMPTOTHECIN DERIVATIVES IMMUNOGEN, INC. 2022-05-05 US disclosed
CN-113493652-A Abrasive composition 山口精研工业株式会社 2021-10-12 CN disclosed
US-20210198524-A1 POLISHING COMPOSITION FOR MAGNETIC DISK SUBSTRATE YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) 2021-07-01 US disclosed
US-10822525-B2 Polishing composition and method for polishing magnetic disk substrate YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) 2020-11-03 US disclosed
US-20200223125-A1 RESIN FOR NANOIMPRINTING, LAMINATE CONTAINING RESIN FOR NANOIMPRINTING, PRINTED BOARD CONTAINING RESIN FOR NANOIMPRINTING, AND METHOD FOR PRODUCING NANOIMPRINT SUBSTRATE JAPAN SCIENCE & TECH AGENCY (JP) 2020-07-16 US disclosed
US-10662272-B2 Polishing composition for magnetic disk substrate YAMAGUCHI SEIKEN KOGYO CO., LTD. (JP) 2020-05-26 US disclosed
US-7090957-B2 Polymerizable composition and planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2006-08-15 US disclosed
US-20060135742-A1 Polymerizable composition and planographic printng plate precursor using the same FUJI PHOTO FILM CO., LTD. 2006-06-22 US disclosed
US-20060127809-A1 Polymerizable composition and planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. 2006-06-15 US disclosed
US-20040234893-A9 Resin composition and thermo/photosensitive composition FUJI PHOTO FILM CO., LTD. 2004-11-25 US disclosed
US-20040223947-A1 Stimuli-responsive polymer utilizing keto-enol tautomerization and stimuli-responsive separating material and chemical-releasing capsule comprising the same JNC CORPORATION (JP) 2004-11-11 US disclosed
US-20040131972-A1 Resin composition and thermo/photosensitive composition FUJI PHOTO FILM CO., LTD. 2004-07-08 US disclosed
US-20040062939-A1 Polymerizable composition and planogaphic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. 2004-04-01 US disclosed
EP-1400851-A2 Polymerizable composition and planographic printing plate precursor using the same FUJI PHOTO FILM CO., LTD. (JP) 2004-03-24 EP disclosed
EP-1389521-A2 Thermosensitive/photosensitive resin composition Fuji Photo Film Co., Ltd. (JP) 2004-02-18 EP disclosed
EP-1248149-A1 Photosensitive lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 2002-10-09 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20040223947-A1 Stimuli-responsive polymer utilizing keto-enol tautomerization and stimuli-responsive separating material and chemical-releasing capsule comprising the same ACMSD, ADSL, CREB1 TSHR 2258/4885ALDH1A1 3055/4885MAPK1 1584/4885
US-20220133711-A1 CAMPTOTHECIN DERIVATIVES TOP2A, TOP2B, PCNA TSHR 3754/4885ALDH1A1 1182/4885MAPK1 2302/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.