Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HSD11B1 | P28845 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.38 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.38 |
| ▸ | HDAC4 | P56524 | 1/20 | 0.37 |
| ▸ | HDAC2 | Q92769 | 1/20 | 0.37 |
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.37 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.37 |
| ▸ | KDM1A | O60341 | 1/20 | 0.33 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.33 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.32 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11148487 | 0.97 | HSD11B1 (0.46) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 | |
| SCHEMBL8989589 | 0.92 | HSD11B1 (0.37) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 | |
| SCHEMBL329274 | 0.84 | HSD11B1 (0.41) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 | |
| SCHEMBL10673707 | 0.83 | HTR6 (0.48) | ALDH1A1PTGS2 | |
| SCHEMBL5576456 | 0.82 | HSD11B1 (0.40) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 | |
| SCHEMBL329275 | 0.82 | HSD11B1 (0.44) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 | |
| SCHEMBL1964873 | 0.82 | ALDH1A1 (0.43) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 | |
| SCHEMBL11793191 | 0.82 | HSD11B1 (0.40) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 | |
| SCHEMBL329663 | 0.82 | HSD11B1 (0.44) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 | |
| SCHEMBL329766 | 0.82 | HSD11B1 (0.44) | HSD11B1ALDH1A1ALOX15HDAC4HDAC2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0530204-B1 | DISPERSANT COMPOSITIONS FOR SUBTERRANEAN WELL DRILLING AND COMPLETION | ATLANTIC RICHFIELD CO (US) | 1996-07-17 | — | — | EP | claimed |
| CN-105826606-B | Electrolyte and lithium ion battery containing same | 宁德时代新能源科技股份有限公司 | 2020-02-18 | — | — | CN | disclosed |
| CN-105826606-A | Electrolyte and lithium ion battery containing same | 宁德时代新能源科技股份有限公司 | 2016-08-03 | — | — | CN | disclosed |
| US-6103866-A | X-RAY SENSITIVE POLY(1,3-HEXADIENE SULFONE) HAVING HIGHER GLASS TRANSITION TEMPERATURE | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 2000-08-15 | — | — | US | disclosed |
| US-5922518-A | EXPOSING THE PHOTORESIST COMPRISING POLY(DIENE SULFONE) TO COLLIMATED X-RAY RADIATION IN A PATTERN CORRESPONDING TO MICROSTRUCTURE AND DEVELOPING THE RESIST WITH NITROALKANE OR NITROCYCLOALKANE TO REMOVE RADIATION EXPOSED PORTION | BOARD OF SUPERVISORS OF LOUISIANA STATE UNIVERSITY AND AGRICULTURAL AND MECHANICAL COLLEGE (US) | 1999-07-13 | — | — | US | disclosed |
| US-5688634-A | OLEFIN-SULFUR DIOXIDE COPOLYMER | LUCENT TECHNOLOGIES INC. (US) | 1997-11-18 | — | — | US | disclosed |
| EP-0698825-A1 | An energy sensitive resist material and a process for device fabrication using the resist material | AT&T Corp. (US) | 1996-02-28 | — | — | EP | disclosed |