SCHEMBL8040587

SCHEMBL8040587

ClC[SiH](c1ccccc1)c1ccc([SiH](CCl)c2ccccc2)cc1

nearest known ligand 0.33

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
TRPA1 O75762 1/20 0.32
ALDH1A1 P00352 1/20 0.32
MAPK1 P28482 1/20 0.32
GSK3B P49841 1/20 0.32
HIF1A Q16665 1/20 0.32
TSHR P16473 1/20 0.32
CALM1 P0DP23 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3134496 0.97 ALDH1A1 (0.33) TRPA1ALDH1A1MAPK1GSK3BHIF1A
SCHEMBL10319853 0.89 LMNA (0.42) ALDH1A1TSHR
SCHEMBL10319291 0.85 TP53 (0.50) TRPA1ALDH1A1MAPK1TSHR
SCHEMBL10317740 0.85 LTA4H (0.48) TSHR
SCHEMBL10319680 0.83 CNR2 (0.36) ALDH1A1
SCHEMBL10320597 0.83 ALDH1A1 (0.42) ALDH1A1MAPK1TSHR
SCHEMBL10319245 0.83 ESR1 (0.31)
SCHEMBL10318822 0.83 TSHR (0.37) ALDH1A1TSHR
SCHEMBL10319283 0.83 CA4 (0.48) TRPA1ALDH1A1MAPK1HIF1ATSHR
SCHEMBL10317595 0.82 CES2 (0.34) ALDH1A1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-60047026-A None JP disclosed
JP-61118745-A None JP disclosed
EP-0661332-B1 Silicon-containing reactive polymer and curable resin composition comprising the same KANEGAFUCHI CHEMICAL IND (JP) 2000-04-12 EP disclosed
EP-0661332-A2 Silicon-containing reactive polymer and curable resin composition comprising the same Kanegafuchi Chemical Industry Co., Ltd. (JP) 1995-07-05 EP disclosed
EP-0129834-B1 PHOTO AND RADIATION-SENSITIVE ORGANOPOLYMERIC MATERIAL HITACHI, LTD. (JP) 1988-03-23 EP disclosed
JP-S61118745-A LIGHT ND RADIATION SENSITIVE ORGANIC POLYMER HITACHI LTD 1986-06-06 JP disclosed
US-4544729-A Photo and radiation-sensitive organopolymeric material HITACHI, LTD. (JP) 1985-10-01 US disclosed
JP-S6047026-A NOVEL POLYMER HITACHI LTD 1985-03-14 JP disclosed