SCHEMBL8055795

SCHEMBL8055795

N#Cc1ccc(OP(=O)(O)O)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRC P12931 2/20 0.54
CA2 P00918 4/20 0.48
CA1 P00915 3/20 0.48
INPPL1 O15357 2/20 0.48
INPP5A Q14642 2/20 0.48
MMP2 P08253 2/20 0.47
BLM P54132 1/20 0.47
PARP15 Q460N3 1/20 0.46
PARP10 Q53GL7 1/20 0.46
PARP2 Q9UGN5 1/20 0.46
CA9 Q16790 2/20 0.46
MAPT P10636 2/20 0.44
KMT2A Q03164 2/20 0.44
KDM4E B2RXH2 1/20 0.44
MEN1 O00255 1/20 0.44
LMNA P02545 1/20 0.44
POLB P06746 1/20 0.44
PKM P14618 1/20 0.44
MAPK1 P28482 1/20 0.44
RAB9A P51151 1/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17512951 0.88 CES2 (0.48) CA2CA1MMP2PARP15PARP10
SCHEMBL2354336 0.84 MMP2 (0.44) CA2CA1MMP2PARP15PARP10
SCHEMBL11599743 0.84 CYP2C19 (0.53) CA2CA1MMP2PARP15PARP10
SCHEMBL572710 0.83 TSHR (0.52) CA2CA1MMP2PARP15PARP10
SCHEMBL329313 0.82 SRC (0.75) SRCCA2CA1INPPL1INPP5A
Ammonia Solution, Strong SCHEMBL10714477 0.79 SRC (0.71) SRCCA2CA1INPPL1INPP5A
SCHEMBL9436530 0.79 SRC (0.54) SRCCA2CA1INPPL1INPP5A
SCHEMBL2354339 0.79 CA2 (0.43) CA2CA1MMP2PARP15PARP10
SCHEMBL13284241 0.79 SRC (0.54) SRCCA2CA1INPPL1INPP5A
SCHEMBL28757584 0.79 CA2 (0.46) CA2CA1MMP2PARP15PARP10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 15 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118678856-A Hole transport material, application thereof, solar cell and preparation method thereof 天合光能股份有限公司 2024-09-20 CN claimed
US-5633111-A Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound FUJI PHOTO FILM CO., LTD. (JP) 1997-05-27 US claimed
US-5254430-A Lithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 1993-10-19 US claimed
US-5230988-A Image exposure of plates of aluminum with phosphate or phosphonate compounds and basic compounds FUJI PHOTO FILM CO., LTD. (JP) 1993-07-27 US claimed
CN-118678856-A Hole transport material, application thereof, solar cell and preparation method thereof 天合光能股份有限公司 2024-09-20 CN disclosed
CN-114401633-A Pest control method, pest control agent composition, and pest control agent set 日本曹达株式会社 2022-04-26 CN disclosed
CN-101189316-A Reinforced pad 3M INNOVATIVE PROPERTIES CO (US) 2008-05-28 CN disclosed
US-6030748-A PHOTOSENSITIVE LAYER OF A HYDROLYZED AND POLYCONDENSED POLYMER OF ORGANOSILICONE OR ORGANOMETALLIC COMPOUND MONOMER IN A SOLVENT HAVING DISSOLVED THEREIN A PHENOL COMPOUND OR AN ORGANIC PHOSPHORIC ACID FUJI PHOTO FILM CO., LTD. (JP) 2000-02-29 US disclosed
US-5633111-A Photoresist composition and article containing 1,2-quinonediazide and an organic phosphorous acid compound FUJI PHOTO FILM CO., LTD. (JP) 1997-05-27 US disclosed
EP-0497351-B1 Presensitized plate for use in making lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 1997-04-23 EP disclosed
EP-0503602-B1 Method of making lithographic printing plate FUJI PHOTO FILM CO LTD (JP) 1995-06-14 EP disclosed
US-5254430-A Lithographic printing plates FUJI PHOTO FILM CO., LTD. (JP) 1993-10-19 US disclosed
US-5230988-A Image exposure of plates of aluminum with phosphate or phosphonate compounds and basic compounds FUJI PHOTO FILM CO., LTD. (JP) 1993-07-27 US disclosed
EP-0503602-A1 Method of making lithographic printing plate Fuji Photo Film Co., Ltd. (JP) 1992-09-16 EP disclosed
EP-0497351-A1 Presensitized plate for use in making lithographic printing plate FUJI PHOTO FILM CO., LTD. (JP) 1992-08-05 EP disclosed