SCHEMBL8059962

SCHEMBL8059962

Cc1ccc(S(=O)(=O)c2cccc(S(=O)(=O)c3ccc(C)cc3)c2S(=O)(=O)c2ccc(C)cc2)cc1

nearest known ligand 0.60

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ GAA P10253 2/20 0.60
▸ RAPGEF4 Q8WZA2 1/20 0.57
▸ KMT2A Q03164 3/20 0.47
▸ HTT P42858 2/20 0.47
▸ SMN1; SMN2 Q16637 1/20 0.47
▸ FEN1 P39748 1/20 0.47
▸ TDP1 Q9NUW8 1/20 0.46
▸ L3MBTL1 Q9Y468 1/20 0.46
▸ ALDH1A1 P00352 3/20 0.46
▸ MEN1 O00255 1/20 0.46
▸ MAPT P10636 1/20 0.46
▸ KDM4E B2RXH2 2/20 0.45
▸ NPSR1 Q6W5P4 1/20 0.45
▸ RXFP1 Q9HBX9 1/20 0.45
▸ EGFR P00533 1/20 0.45
▸ SRC P12931 1/20 0.45
▸ CA12 O43570 1/20 0.45
▸ CA1 P00915 1/20 0.45
▸ CA2 P00918 1/20 0.45
▸ CA3 P07451 1/20 0.45

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9580692 0.86 GAA (0.54) GAARAPGEF4KMT2AHTTSMN1; SMN2
SCHEMBL31000980 0.85 GAA (0.68) GAARAPGEF4KMT2AHTTSMN1; SMN2
SCHEMBL11853033 0.85 GAA (0.68) GAARAPGEF4KMT2AHTTSMN1; SMN2
SCHEMBL9768386 0.82 CA2 (0.50) GAARAPGEF4KMT2AHTTSMN1; SMN2
SCHEMBL9634824 0.80 GAA (0.56) GAARAPGEF4KMT2AHTTSMN1; SMN2
SCHEMBL8911211 0.79 ALDH1A1 (0.60) KMT2AHTTSMN1; SMN2FEN1ALDH1A1
SCHEMBL30893040 0.79 GAA (0.60) GAARAPGEF4KMT2AHTTSMN1; SMN2
SCHEMBL8964467 0.79 GAA (0.60) GAARAPGEF4KMT2AHTTSMN1; SMN2
SCHEMBL2068967 0.77 KMT2A (0.53) GAARAPGEF4KMT2AHTTSMN1; SMN2
SCHEMBL7081730 0.77 GAA (0.52) GAARAPGEF4KMT2AHTTSMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115403976-B Anti-reflection coating composition 嘉庚创新实验室 2023-04-18 — — CN disclosed
CN-115403976-A Anti-reflection coating composition 嘉庚创新实验室 2022-11-29 — — CN disclosed
US-6090518-A HAVING HIGH RESOLUTION, WHICH IS USEFUL FOR A HALFMICRONLITHOGRAPHY EMPLOYING A RADIATION MITSUBISHI CHEMICAL CORPORATION (JP) 2000-07-18 — — US disclosed
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