SCHEMBL8074584

SCHEMBL8074584

Cc1ccc(C(=O)CS(OS(=O)(=O)c2ccc(C)cc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.62

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
HSD11B1 P28845 7/20 0.62
RECQL P46063 2/20 0.58
NPC1 O15118 4/20 0.47
RAB9A P51151 4/20 0.47
MEN1 O00255 1/20 0.47
KMT2A Q03164 1/20 0.47
LMNA P02545 2/20 0.47
ALDH1A1 P00352 4/20 0.46
PKM P14618 2/20 0.46
STAT3 P40763 1/20 0.43
USP2 O75604 1/20 0.42
MAPT P10636 2/20 0.42
SMN1; SMN2 Q16637 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8752339 0.81 HSD11B1 (0.58) HSD11B1RECQLNPC1RAB9AMEN1
SCHEMBL8060332 0.79 HSD11B1 (0.66) HSD11B1NPC1RAB9AMEN1KMT2A
SCHEMBL6202982 0.77 HSD11B1 (1.00) HSD11B1RECQLNPC1RAB9AMEN1
SCHEMBL11347507 0.77 BCHE (0.43) HSD11B1RECQLMEN1KMT2ALMNA
SCHEMBL3267933 0.77 HTT (0.53) MEN1KMT2ALMNAALDH1A1SMN1; SMN2
SCHEMBL2422002 0.74 RECQL (1.00) HSD11B1RECQLNPC1RAB9AMEN1
SCHEMBL1089246 0.74 RECQL (0.60) HSD11B1RECQLNPC1RAB9AMEN1
SCHEMBL11338733 0.73 CYP3A4 (0.40) HSD11B1RECQLMEN1KMT2ALMNA
SCHEMBL29609963 0.73 RECQL (0.97) HSD11B1RECQLNPC1RAB9AMEN1
SCHEMBL9626702 0.72 HSD11B1 (0.51) HSD11B1RECQLNPC1RAB9AMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0665470-B1 Method for forming a fine pattern MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 2000-08-02 EP disclosed
US-5518579-A SEMICONDUCTORS MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1996-05-21 US disclosed
EP-0665470-A2 Method for forming a fine pattern MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. (JP) 1995-08-02 EP disclosed