Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 6/20 | 0.42 |
| ▸ | NPSR1 | Q6W5P4 | 5/20 | 0.42 |
| ▸ | LMNA | P02545 | 4/20 | 0.42 |
| ▸ | TDP1 | Q9NUW8 | 3/20 | 0.42 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.42 |
| ▸ | NPC1 | O15118 | 1/20 | 0.42 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.42 |
| ▸ | MEN1 | O00255 | 5/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 5/20 | 0.40 |
| ▸ | ALOX15 | P16050 | 3/20 | 0.39 |
| ▸ | HTT | P42858 | 3/20 | 0.39 |
| ▸ | TP53 | P04637 | 2/20 | 0.39 |
| ▸ | GAA | P10253 | 2/20 | 0.39 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.39 |
| ▸ | USP2 | O75604 | 2/20 | 0.39 |
| ▸ | TSHR | P16473 | 2/20 | 0.39 |
| ▸ | CASP1 | P29466 | 2/20 | 0.39 |
| ▸ | CASP7 | P55210 | 2/20 | 0.39 |
| ▸ | APAF1 | O14727 | 1/20 | 0.36 |
| ▸ | TUBB4A | P04350 | 2/20 | 0.35 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3896874 | 0.89 | LMNA (0.46) | MAPTNPSR1LMNATDP1L3MBTL1 | |
| SCHEMBL3891496 | 0.84 | NPSR1 (0.46) | MAPTNPSR1LMNATDP1L3MBTL1 | |
| SCHEMBL27665904 | 0.82 | KMT2A (0.39) | MAPTNPSR1LMNATDP1L3MBTL1 | |
| SCHEMBL3907415 | 0.75 | MEN1 (0.44) | MAPTNPSR1LMNATDP1L3MBTL1 | |
| SCHEMBL9626207 | 0.70 | NPSR1 (0.51) | MAPTNPSR1LMNATDP1L3MBTL1 | |
| SCHEMBL18213657 | 0.70 | NPSR1 (0.47) | MAPTNPSR1LMNATDP1L3MBTL1 | |
| SCHEMBL5282494 | 0.70 | MEN1 (0.36) | MEN1KMT2AALDH1A1HTR2AHTR2C | |
| SCHEMBL18213652 | 0.69 | LMNA (0.49) | MAPTNPSR1LMNATDP1L3MBTL1 | |
| SCHEMBL10535122 | 0.69 | NPSR1 (0.43) | MAPTNPSR1LMNATDP1L3MBTL1 | |
| SCHEMBL28608473 | 0.69 | CYP2C9 (0.64) | MAPTNPSR1LMNATDP1L3MBTL1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1705007-B1 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORP (JP) | 2012-06-06 | — | — | EP | disclosed |
| US-8127675-B2 | Lithographic printing plate precursor and lithographic printing method | FUJIFILM CORPORATION (JP) | 2012-03-06 | — | — | US | disclosed |
| US-7662540-B2 | Support, photosensitive layer, protective film; photosensitive layer and protective film being formed in this order on support, wherein number of fish-eyes each having area of 2,000 mu m2 or more and maximum height measured from film surface of 1 mu m to 7 mu m residing in film is 50/m2-1,000/m2 | FUJIFILM CORPORATION (JP) | 2010-02-16 | — | — | US | disclosed |
| US-20100005989-A1 | LITHOGRAPHIC PRINTING PLATE PRECURSOR AND LITHOGRAPHIC PRINTING METHOD | FUJIFILM CORPORATION | 2010-01-14 | — | — | US | disclosed |
| EP-1765592-B1 | METHOD FOR MAKING NEGATIVE-WORKING HEAT-SENSITIVE LITHOGRAPHIC PRINTING PLATE PRECURSOR | AGFA GRAPHICS NV (BE) | 2009-01-28 | — | — | EP | disclosed |
| US-20080311524-A1 | Method For Making Negative-Working Heat-Sensitive Lithographic Printing Plate Precursor | AGFA GRAPHICS N.V. (BE) | 2008-12-18 | — | — | US | disclosed |
| US-20080268374-A1 | Photosensitive Composition, Pattern Forming Material, Photosensitive Laminate, Pattern Forming Apparatus, and Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-10-30 | — | — | US | disclosed |
| US-7402374-B2 | Method for colored image formation | FUJIFILM CORPORATION (JP) | 2008-07-22 | — | — | US | disclosed |
| US-20080118867-A1 | Pattern Forming Material, Pattern Forming Apparatus, And Pattern Forming Process | ASAHI KASEI E-MATERIALS CORPORATION (JP) | 2008-05-22 | — | — | US | disclosed |
| US-20080113302-A1 | Pattern Forming Process | FUJIFILM CORPORATION (JP) | 2008-05-15 | — | — | US | disclosed |
| US-5030548-A | Photoiniator system comprising a 4,4'-bis(dialkylamino) benzophenone, an aromatic ketone and lophine dimer; also present a halogen compound leuco and dye; lithography; printing plates; photoresists | FUJI PHOTO FILM CO., LTD. (JP) | 1991-07-09 | — | — | US | disclosed |
| EP-0239868-B1 | PHOTOCHROMIC SYSTEM, LAYER PREPARED THEREOF AND ITS USE | BASF Aktiengesellschaft (DE) | 1989-12-27 | — | — | EP | disclosed |
| US-4857438-A | Photochromic system and layers produced therewith | BASF AKTIENGESELLSCHAFT (DE) | 1989-08-15 | — | — | US | disclosed |
| EP-0239868-A1 | Photochromic system, layer prepared thereof and its use | BASF Aktiengesellschaft (DE) | 1987-10-07 | — | — | EP | disclosed |
| US-4332884-A | USING A DIOXIME CHELATING AGENT | RICOH CO., LTD. (JP) | 1982-06-01 | — | — | US | disclosed |
| US-4315068-A | CONTAINING A COBALT-AMMINE COMPLEX AND A DIOXIME OR A BISIMIDAZOLIN-3-ONE CHELATING AGENT; STABILITY; COLOR DILMS | RICOH CO., LTD. (JP) | 1982-02-09 | — | — | US | disclosed |
| US-4306014-A | AMMONIA OR AMINES SUPPRESS THE COLOR-FORMING REACTION SYSTEM | RICOH CO., LTD. (JP) | 1981-12-15 | — | — | US | disclosed |
| US-4271251-A | LEUCO DYE, PHOTOOXIDIZER, 2,4-DIHYDROXY-BENZALDOXIME | FUJI PHOTO FILM CO., LTD. (JP) | 1981-06-02 | — | — | US | disclosed |
| US-4251619-A | Process for forming photo-polymeric image | KONISHIROKU PHOTO INDUSTRY CO., LTD. (JP) | 1981-02-17 | — | — | US | disclosed |
| US-4139390-A | Presensitized printing plate having a print-out image | EASTMAN KODAK COMPANY (US) | 1979-02-13 | — | — | US | disclosed |