Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SCN5A | Q14524 | 3/20 | 0.36 |
| ▸ | SCN9A | Q15858 | 3/20 | 0.36 |
| ▸ | KIF11 | P52732 | 4/20 | 0.35 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.33 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.33 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.33 |
| ▸ | MGLL | Q99685 | 1/20 | 0.31 |
| ▸ | CNR1 | P21554 | 2/20 | 0.31 |
| ▸ | CNR2 | P34972 | 2/20 | 0.31 |
| ▸ | SLC22A1 | O15245 | 2/20 | 0.31 |
| ▸ | PSMD14 | O00487 | 1/20 | 0.31 |
| ▸ | HSP90AA1 | P07900 | 1/20 | 0.31 |
| ▸ | MMP2 | P08253 | 1/20 | 0.31 |
| ▸ | MC4R | P32245 | 1/20 | 0.31 |
| ▸ | RAD52 | P43351 | 1/20 | 0.31 |
| ▸ | GRM2 | Q14416 | 1/20 | 0.31 |
| ▸ | KCNN4 | O15554 | 1/20 | 0.31 |
| ▸ | TLR8 | Q9NR97 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Tetrabuthylammonium SCHEMBL18094600 | 0.88 | — | — | |
| Tetrylammonium SCHEMBL3361652 | 0.88 | KIF11 (0.37) | SCN5ASCN9AKIF11CYP3A4CYP2D6 | |
| Tetramethylammonium Ion SCHEMBL3362588 | 0.86 | KIF11 (0.37) | KIF11CYP3A4CYP2D6CYP2C9CYP2C19 | |
| Tetrabuthylammonium SCHEMBL810025 | 0.84 | KIF11 (0.42) | KIF11CYP3A4CYP2D6CYP2C9CYP2C19 | |
| Tetrylammonium SCHEMBL3361102 | 0.82 | KIF11 (0.38) | KIF11CYP3A4CYP2D6CYP2C9CYP2C19 | |
| Tetrabuthylammonium SCHEMBL125867 | 0.81 | SCN5A (0.32) | SCN5ASCN9AKIF11 | |
| Tetrabuthylammonium SCHEMBL17205432 | 0.81 | SCN5A (0.32) | SCN5ASCN9AKIF11 | |
| Tetramethylammonium Ion SCHEMBL3360720 | 0.81 | KIF11 (0.39) | KIF11CYP3A4CYP2D6CYP2C9CYP2C19 | |
| Tetrabuthylammonium SCHEMBL1350363 | 0.78 | KIF11 (0.44) | KIF11CYP3A4CYP2D6CYP2C9CYP2C19 | |
| SCHEMBL8350816 | 0.76 | KIF11 (0.43) | KIF11CYP3A4SLC22A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 115 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20260022199-A1 | HOLOGRAPHIC PHOTOPOLYMER MATERIAL, HOLOGRAPHIC PHOTOSENSITIVE FILM, HOLOGRAPHIC OPTICAL ELEMENT, AND DISPLAY DEVICE | HUAWEI TECH CO LTD (CN) | 2026-01-22 | — | — | US | claimed |
| EP-4668017-A1 | HOLOGRAPHIC PHOTOPOLYMERIZABLE MATERIAL, HOLOGRAPHIC PHOTOSENSITIVE FILM, HOLOGRAPHIC OPTICAL ELEMENT, AND DISPLAY DEVICE | Huawei Technologies Co., Ltd. (CN) | 2025-12-24 | — | — | EP | claimed |
| EP-4291587-A1 | PHOTOPOLYMERIZABLE HOE COMPOSITION | Xetos AG (DE) | 2023-12-20 | — | — | EP | claimed |
| EP-4291951-A1 | TWO-COMPONENT SYSTEM | Xetos AG (DE) | 2023-12-20 | — | — | EP | claimed |
| EP-4291953-A1 | IMPROVED BLEACHING | Xetos AG (DE) | 2023-12-20 | — | — | EP | claimed |
| WO-2022171821-A1 | PHOTOPOLYMERIZABLE HOE COMPOSITION | XETOS AG (DE) | 2022-08-18 | — | — | WO | claimed |
| WO-2022171814-A1 | TWO-COMPONENT SYSTEM | XETOS AG (DE) | 2022-08-18 | — | — | WO | claimed |
| WO-2022171820-A1 | IMPROVED BLEACHING | XETOS AG (DE) | 2022-08-18 | — | — | WO | claimed |
| EP-2218745-B1 | Prepolymer-based polyurethane formulations for producing holographic films | BAYER MATERIALSCIENCE AG (DE) | 2011-11-23 | — | — | EP | claimed |
| US-20100203241-A1 | Prepolymer-Based Polyurethane Formulations For The Production Of Holographic Films | BAYER MATERIALSCIENCE AG (DE) | 2010-08-12 | — | — | US | claimed |
| US-20260022199-A1 | HOLOGRAPHIC PHOTOPOLYMER MATERIAL, HOLOGRAPHIC PHOTOSENSITIVE FILM, HOLOGRAPHIC OPTICAL ELEMENT, AND DISPLAY DEVICE | HUAWEI TECH CO LTD (CN) | 2026-01-22 | — | — | US | disclosed |
| EP-4668017-A1 | HOLOGRAPHIC PHOTOPOLYMERIZABLE MATERIAL, HOLOGRAPHIC PHOTOSENSITIVE FILM, HOLOGRAPHIC OPTICAL ELEMENT, AND DISPLAY DEVICE | Huawei Technologies Co., Ltd. (CN) | 2025-12-24 | — | — | EP | disclosed |
| EP-4291951-A1 | TWO-COMPONENT SYSTEM | Xetos AG (DE) | 2023-12-20 | — | — | EP | disclosed |
| WO-2022171814-A1 | TWO-COMPONENT SYSTEM | XETOS AG (DE) | 2022-08-18 | — | — | WO | disclosed |
| WO-2022171823-A1 | PHOTOPOLYMERIZABLE COMPOSITION | XETOS AG (DE) | 2022-08-18 | — | — | WO | disclosed |
| US-7232647-B2 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2007-06-19 | — | — | US | disclosed |
| US-7220533-B2 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2007-05-22 | — | — | US | disclosed |
| US-20050164124-A1 | Photosensitive resin composition, photosensitive element using the same, method for producing resist pattern and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2005-07-28 | — | — | US | disclosed |
| US-20040038149-A1 | Photosensitive resin composition, photosensitive element comprising the same, method for producing resist pattern, and method for producing printed wiring board | HITACHI CHEMICAL CO., LTD. (JP) | 2004-02-26 | — | — | US | disclosed |
| EP-1282010-A1 | PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE ELEMENT COMPRISING THE SAME, METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PRINTED WIRING BOARD | HITACHI CHEMICAL COMPANY, LTD. (JP) | 2003-02-05 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260022199-A1 | HOLOGRAPHIC PHOTOPOLYMER MATERIAL, HOLOGRAPHIC PHOTOSENSITIVE FILM, HOLOGRAPHIC OPTICAL ELEMENT, AND DISPLAY DEVICE | VCL, MACF1, FGB | SCN5A 3064/4885SCN9A 1130/4885KIF11 1945/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.