SCHEMBL8137186

SCHEMBL8137186

O=S(=O)(Oc1cccc(OS(=O)(=O)c2ccc(Br)cc2)c1OS(=O)(=O)c1ccc(Br)cc1)c1ccc(Br)cc1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
LMNA P02545 3/20 0.48
MAPT P10636 2/20 0.48
KDM4E B2RXH2 1/20 0.48
THRB P10828 1/20 0.48
HPGD P15428 1/20 0.48
METAP2 P50579 1/20 0.44
METAP1 P53582 1/20 0.44
MEN1 O00255 1/20 0.43
ESR1 P03372 1/20 0.43
GAA P10253 1/20 0.43
KMT2A Q03164 1/20 0.43
ESR2 Q92731 1/20 0.43
CA2 P00918 4/20 0.41
HSD11B1 P28845 1/20 0.41
HSD17B3 P37058 1/20 0.41
TUBB4A P04350 1/20 0.40
TUBB P07437 1/20 0.40
TUBA3C P0DPH7 1/20 0.40
TUBA1B P68363 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL926736 0.83 METAP2 (0.45) ALDH1A1LMNAMAPTMETAP2METAP1
SCHEMBL2879497 0.82 METAP2 (0.60) ALDH1A1LMNAMAPTKDM4EHPGD
SCHEMBL6551588 0.81 TDP1 (0.53) ALDH1A1MAPTKDM4EHPGDMETAP2
SCHEMBL64533 0.81 KMT2A (0.62) ALDH1A1LMNAMAPTKDM4EHPGD
SCHEMBL2881876 0.79 TUBB4A (0.63) ALDH1A1LMNAMEN1ESR1GAA
SCHEMBL8434497 0.77 HSD11B1 (0.48) ALDH1A1METAP2METAP1MEN1ESR1
SCHEMBL929164 0.77 ALPL (0.53) ALDH1A1LMNAMAPTMETAP2METAP1
SCHEMBL2884331 0.76 MEN1 (0.52) ALDH1A1LMNAMAPTMETAP2METAP1
SCHEMBL4538720 0.76 PLCG1 (0.45) ALDH1A1LMNAMAPTKDM4ETHRB
SCHEMBL28100041 0.74 KMT2A (0.54) ALDH1A1LMNAMAPTKDM4EHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6063545-A Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture CLARIANT GMBH (DE) 2000-05-16 US disclosed
EP-0510446-B1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith CLARIANT GMBH (DE) 1998-12-16 EP disclosed
EP-0510446-A1 Negative-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1992-10-28 EP disclosed