SCHEMBL81552

SCHEMBL81552

CCN(CC)c1ccc(C)c(C(c2cc(N(CC)CC)ccc2C)c2cc(N(CC)CC)ccc2C)c1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S100B P04271 1/20 0.53
TERT O14746 1/20 0.46
ALDH1A1 P00352 11/20 0.42
L3MBTL1 Q9Y468 5/20 0.42
CYP3A4 P08684 3/20 0.42
MAPK1 P28482 3/20 0.42
HSD17B10 Q99714 3/20 0.42
HPGD P15428 2/20 0.42
GLA P06280 2/20 0.42
CASP1 P29466 2/20 0.42
CASP7 P55210 2/20 0.42
IGLV6-57 P01721 1/20 0.42
ATM Q13315 1/20 0.42
HIF1A Q16665 1/20 0.42
TSHR P16473 2/20 0.42
RECQL P46063 2/20 0.42
PSMD14 O00487 1/20 0.42
GFER P55789 1/20 0.42
TDP1 Q9NUW8 1/20 0.42
MAPT P10636 6/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL237232 0.96 S100B (0.50) S100BTERTALDH1A1L3MBTL1CYP3A4
Oxalic Acid SCHEMBL238206 0.90 S100B (0.45) S100BTERTALDH1A1L3MBTL1CYP3A4
SCHEMBL11520124 0.89 GRK6 (0.48) S100BTERTALDH1A1L3MBTL1CYP3A4
SCHEMBL5007900 0.89 GRK6 (0.48) S100BTERTALDH1A1L3MBTL1CYP3A4
SCHEMBL12907121 0.86 S100B (0.52) S100BTERTALDH1A1L3MBTL1CYP3A4
SCHEMBL237533 0.86 S100B (0.45) S100BTERTALDH1A1L3MBTL1CYP3A4
SCHEMBL80268 0.86 MAPT (0.58) S100BTERTALDH1A1L3MBTL1CYP3A4
SCHEMBL5555831 0.85 S100B (0.44) S100BTERTALDH1A1L3MBTL1CYP3A4
SCHEMBL81551 0.84 S100B (0.58) S100BTERTALDH1A1L3MBTL1CYP3A4
SCHEMBL5554872 0.84 ALDH1A1 (0.44) S100BTERTALDH1A1CYP3A4ATM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 91 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5145760-A POSITIVE-WORKING PHOTOSENSITIVE ELECTROSTATIC MASTER WITH IMPROVED INVIRONMENTAL LATITUDE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-09-08 US claimed
EP-0405543-A2 Photosensitive leuco dye containing electrostatic master with printout image E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-01-02 EP claimed
US-4945020-A MIXTURE OF POLYMIERC BINDER, PHOTOOXIDANT, LEUCO DYE, HALOGENATED HYDROCARBON AND PLASTICIZER E. I. DU PONT DE NEMOURS AND COMPANY (US) 1990-07-31 US claimed
EP-0315120-A2 Photohardenable electrostatic master having improved backtransfer and charge decay E.I. DU PONT DE NEMOURS AND COMPANY (US) 1989-05-10 EP claimed
US-4818660-A POLYMERIC BINDER AND UNSATURATED COMPOUND, PHOTOINITIATOR, BAS IC DYE, LEUCO DYE AND STRONG ACID E. I. DU PONT DE NEMOURS AND COMPANY (US) 1989-04-04 US claimed
US-4701300-A Polyamide ester photoresist formulations of enhanced sensitivity MERCK PATENT GESELLSCHAFT MIT BESCHRANKTER HAFTUNG (DE) 1987-10-20 US claimed
US-4090877-A COLOR PHOTOGRAPHY MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1978-05-23 US claimed
JP-62106449-A None JP disclosed
JP-62089956-A None JP disclosed
JP-62106450-A None JP disclosed
EP-2541322-B1 Composition, process of preparation and method of application and exposure for light imaging paper INT PAPER CO (US) 2015-08-12 EP disclosed
EP-2899592-A1 Coated substrate comprising a dual wavelength image-forming particulate composition and a process for making said composition INTERNATIONAL PAPER COMPANY (US) 2015-07-29 EP disclosed
US-20150185608-A1 IMAGING PARTICULATES, PAPER AND PROCESS, AND IMAGING OF PAPER USING DUAL WAVELENGTH LIGHT INTERNATIONAL PAPER COMPANY 2015-07-02 US disclosed
US-4247618-A LEUCO DYES, PHOTOOXIDANT E. I. DU PONT DE NEMOURS AND COMPANY (US) 1981-01-27 US disclosed
EP-0019219-A1 Improved photoimaging systems with cyclic hydrazides E.I. DU PONT DE NEMOURS AND COMPANY (US) 1980-11-26 EP disclosed
US-4224225-A PHOTOPOLYMERIZATION INITIATOR FUJI PHOTO FILM CO., LTD. (JP) 1980-09-23 US disclosed
US-4176028-A ADDITION POLYMER AND UNSATURATED MONOMER, PHOTOPOLYMERIZABLE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1979-11-27 US disclosed
US-4173673-A Dot-etchable masks from photopolymerizable elements E. I. DU PONT DE NEMOURS AND COMPANY (US) 1979-11-06 US disclosed
US-4139390-A Presensitized printing plate having a print-out image EASTMAN KODAK COMPANY (US) 1979-02-13 US disclosed
US-4125700-A Preparation of methyl methacrylate polymer powders for use in plastisols E. I. DU PONT DE NEMOURS AND COMPANY (US) 1978-11-14 US disclosed