SCHEMBL8208644

SCHEMBL8208644

O=c1c2c(F)c3c(=O)n(-c4ccccc4)c(=O)c3c(F)c2c(=O)n1-c1ccccc1

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.56
GSK3A P49840 6/20 0.46
GSK3B P49841 6/20 0.46
GAA P10253 1/20 0.46
KMT2A Q03164 2/20 0.41
JAK2 O60674 1/20 0.41
JAK3 P52333 1/20 0.41
NPSR1 Q6W5P4 2/20 0.40
L3MBTL1 Q9Y468 2/20 0.40
PMM2 O15305 2/20 0.40
MPI P34949 2/20 0.40
PHOSPHO1 Q8TCT1 2/20 0.40
APOBEC3G Q9HC16 1/20 0.40
TLR9 Q9NR96 1/20 0.40
PGR P06401 1/20 0.39
KDM4E B2RXH2 2/20 0.38
MEN1 O00255 1/20 0.38
QSOX1 O00391 1/20 0.38
RGS12 O14924 1/20 0.38
PLIN1 O60240 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12660977 0.85 MAPK1 (0.65) MAPK1GSK3AGSK3BGAAKMT2A
SCHEMBL5306506 0.80 MAPK1 (0.71) MAPK1GSK3AGSK3BGAAKMT2A
SCHEMBL8209629 0.77 MAPK1 (0.56) MAPK1GSK3AGSK3BGAAKMT2A
SCHEMBL10607179 0.74 MAPK1 (0.71) MAPK1GSK3AGSK3BGAAKMT2A
SCHEMBL12660980 0.74 FAAH (0.55) GAAKMT2AL3MBTL1PMM2MPI
SCHEMBL14505675 0.73 MAPK1 (0.75) MAPK1GSK3AGSK3BGAAKMT2A
SCHEMBL13310390 0.71 MAPK1 (0.74) MAPK1GSK3AGSK3BGAAKMT2A
SCHEMBL12660985 0.71 MGLL (0.48) MAPK1GSK3AGSK3BL3MBTL1PMM2
SCHEMBL10438652 0.71 MAPK1 (0.60) MAPK1GSK3AGSK3BGAAKMT2A
SCHEMBL23312315 0.71 PDE7A (0.49) MAPK1GSK3AGSK3BGAAKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6046342-A 3, 6-bis[4-(alkyloxy) phenyloxy] pyromellitic dianhydrides and process for preparing the same KOREA ADVANCED INSTITUTE OF SCIENCE AND TECHNOLOGY (KR) 2000-04-04 US disclosed