Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LMNA | P02545 | 2/20 | 0.44 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.44 |
| ▸ | NPC1 | O15118 | 2/20 | 0.44 |
| ▸ | RAB9A | P51151 | 2/20 | 0.44 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.44 |
| ▸ | CASP3 | P42574 | 1/20 | 0.44 |
| ▸ | ATM | Q13315 | 1/20 | 0.44 |
| ▸ | SENP8 | Q96LD8 | 1/20 | 0.44 |
| ▸ | SENP7 | Q9BQF6 | 1/20 | 0.44 |
| ▸ | SENP6 | Q9GZR1 | 1/20 | 0.44 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.44 |
| ▸ | CA12 | O43570 | 1/20 | 0.44 |
| ▸ | CA2 | P00918 | 1/20 | 0.44 |
| ▸ | CA5A | P35218 | 1/20 | 0.44 |
| ▸ | CA9 | Q16790 | 1/20 | 0.44 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.44 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.44 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.44 |
| ▸ | ESR1 | P03372 | 2/20 | 0.44 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL31215161 | 1.00 | LMNA (0.44) | LMNASMN1; SMN2NPC1RAB9AMAPK1 | |
| Phenol SCHEMBL28873361 | 0.88 | ESR1 (0.50) | LMNASMN1; SMN2NPC1RAB9AMAPK1 | |
| SCHEMBL779789 | 0.84 | MAPK1 (0.52) | LMNASMN1; SMN2NPC1RAB9AMAPK1 | |
| SCHEMBL5648833 | 0.84 | CNR1 (0.43) | LMNAALDH1A1CYP3A4CA12CA2 | |
| SCHEMBL13930904 | 0.83 | ESR1 (0.44) | LMNASMN1; SMN2ALDH1A1CYP3A4CA12 | |
| SCHEMBL11783483 | 0.83 | ALDH1A1 (0.44) | LMNASMN1; SMN2ALDH1A1CYP3A4CA12 | |
| SCHEMBL6027444 | 0.83 | CNR1 (0.46) | LMNAALDH1A1CYP3A4CA12CA2 | |
| SCHEMBL393199 | 0.83 | ESR1 (0.58) | LMNASMN1; SMN2ALDH1A1CYP3A4CA12 | |
| Water SCHEMBL27961448 | 0.82 | MAPK1 (0.50) | LMNASMN1; SMN2NPC1RAB9AMAPK1 | |
| Phenol SCHEMBL11800897 | 0.82 | HSD17B1 (0.44) | LMNASMN1; SMN2NPC1RAB9AMAPK1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 283 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-07-04 | — | — | US | disclosed |
| CN-110003582-B | Heat-resistant styrene resin composition, molded article, extruded sheet, and container for food packaging | 东洋苯乙烯股份有限公司 | 2024-07-02 | — | — | CN | disclosed |
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-06-27 | — | — | US | disclosed |
| CN-114599688-B | Method for preparing vinyl chloride polymer composite material, vinyl chloride polymer composite material and composition comprising the same | 株式会社LG化学 | 2024-02-06 | — | — | CN | disclosed |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-12-12 | — | — | US | disclosed |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | JSR CORPORATION (JP) | 2023-11-30 | — | — | US | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822241-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-11-21 | — | — | US | disclosed |
| EP-0252007-A2 | 2-Propanol derivatives as corrosion inhibitors | CIBA-GEIGY AG (CH) | 1988-01-07 | — | — | EP | disclosed |
| US-4692555-A | Preparation of diphenolics | ETHYL CORPORATION (US) | 1987-09-08 | — | — | US | disclosed |
| EP-0032062-B1 | HIGH-MOLECULAR-WEIGHT NOVOLAK SUBSTITUTED PHENOLIC RESINS AND THEIR PREPARATION | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1985-04-03 | — | — | EP | disclosed |
| EP-0032060-B1 | NOVOLAK RESIN COMPOSITION AND PRODUCTS FORMED THEREFROM | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1984-10-24 | — | — | EP | disclosed |
| US-4391827-A | 3-(2-Hydroxy-4-(substituted)phenyl)-cycloalkanone and cycloalkanol analgesic agents and intermediates therefor | PFIZER INC. (US) | 1983-07-05 | — | — | US | disclosed |
| US-4345054-A | High-molecular-weight novolak types substituted phenolic resins and process for preparation thereof | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1982-08-17 | — | — | US | disclosed |
| US-4342852-A | Setting type resin composition containing a substantially linear, high-molecular-weight novolak substituted phenolic resin | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1982-08-03 | — | — | US | disclosed |
| US-4306097-A | 3-[2-Hydroxy-4-(substituted)phenyl]-cycloalkanol analgesic agents | PFIZER INC. (US) | 1981-12-15 | — | — | US | disclosed |
| EP-0032062-A2 | High-molecular-weight novolak substituted phenolic resins and their preparation | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1981-07-15 | — | — | EP | disclosed |
| EP-0032060-A2 | Novolak resin composition and products formed therefrom | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1981-07-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (7 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240210824-A1 | CARBOXYLATE, CARBOXYLIC ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | SCO2, CBR1, OXGR1 | LMNA 4690/4885SMN1; SMN2 4386/4885NPC1 4049/4885 |
| US-20230384676-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD OF FORMING PATTERN, POLYMER, AND COMPOUND | RER1, RFT1, RAD51 | LMNA 1058/4885SMN1; SMN2 2998/4885NPC1 3033/4885 |
| US-11822244-B2 | Compound, resin, resist composition and method for producing resist pattern | RER1, AFF1, AFF4 | LMNA 3320/4885SMN1; SMN2 1754/4885NPC1 2284/4885 |
| US-20240219830-A1 | SALT, ACID GENERATOR, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN | H1-0, HCN3, RER1 | LMNA 3803/4885SMN1; SMN2 4431/4885NPC1 2198/4885 |
| US-11820736-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, H1-2 | LMNA 4023/4885SMN1; SMN2 3424/4885NPC1 3894/4885 |
| US-11822241-B2 | Salt, acid generator, resist composition and method for producing resist pattern | H1-10, H1-0, CHRM1 | LMNA 3440/4885SMN1; SMN2 1965/4885NPC1 3982/4885 |
| US-11840503-B2 | Salt, acid generator, resist composition and method for producing resist pattern | RER1, H1-0, CA7 | LMNA 4757/4885SMN1; SMN2 3407/4885NPC1 3378/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.