SCHEMBL13683034

SCHEMBL13683034

CCC(C)c1ccc(OCOc2cc3ccccc3cc2OC)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 6/20 0.44
TSHR P16473 1/20 0.44
MAPT P10636 3/20 0.43
LMNA P02545 2/20 0.43
TP53 P04637 2/20 0.43
ALOX12 P18054 1/20 0.43
GAA P10253 2/20 0.41
PTPRE P23469 1/20 0.41
NQO1 P15559 1/20 0.40
NPC1 O15118 3/20 0.39
RAB9A P51151 3/20 0.39
MEN1 O00255 2/20 0.39
KMT2A Q03164 2/20 0.39
AHR P35869 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
HIF1A Q16665 1/20 0.38
HSP90AA1 P07900 1/20 0.38
L3MBTL1 Q9Y468 1/20 0.38
SMN1; SMN2 Q16637 2/20 0.38
SLC7A5 Q01650 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL825489 0.87 ALDH1A1 (0.48) ALDH1A1TSHRMAPTLMNATP53
SCHEMBL825488 0.85 ALDH1A1 (0.47) ALDH1A1TSHRMAPTTP53GAA
SCHEMBL14118594 0.83 ALDH1A1 (0.44) ALDH1A1TSHRMAPTLMNATP53
SCHEMBL14118678 0.83 MAPT (0.54) ALDH1A1TSHRMAPTLMNATP53
SCHEMBL825353 0.82 ALDH1A1 (0.49) ALDH1A1TSHRTP53GAANPC1
SCHEMBL13683030 0.82 ALDH1A1 (0.41) ALDH1A1TSHRMAPTLMNATP53
SCHEMBL825531 0.81 KCNA3 (0.47) ALDH1A1TSHRLMNATP53L3MBTL1
SCHEMBL825588 0.80 ALDH1A1 (0.58) ALDH1A1TSHRMAPTGAANPC1
SCHEMBL825494 0.80 ALDH1A1 (0.60) ALDH1A1TSHRMAPTLMNAGAA
SCHEMBL11113379 0.80 ALDH1A1 (0.62) ALDH1A1TSHRMAPTLMNAGAA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed