SCHEMBL825634

SCHEMBL825634

CCC(C)c1ccc(OCOc2ccc(C)c(C)c2)cc1

nearest known ligand 0.50

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 4/20 0.50
TSHR P16473 1/20 0.50
TDP1 Q9NUW8 3/20 0.46
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
SMN1; SMN2 Q16637 2/20 0.43
GAA P10253 2/20 0.43
HPGD P15428 1/20 0.43
NPC1 O15118 3/20 0.41
RAB9A P51151 2/20 0.41
DRD2 P14416 1/20 0.40
DRD4 P21917 1/20 0.40
DRD3 P35462 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
HSP90AA1 P07900 1/20 0.39
MAPT P10636 2/20 0.39
POLB P06746 1/20 0.38
PPARG P37231 1/20 0.37
PPARA Q07869 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11113379 0.86 ALDH1A1 (0.62) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL825526 0.83 ALDH1A1 (0.56) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL825483 0.81 ALDH1A1 (0.48) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL825588 0.80 ALDH1A1 (0.58) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL825494 0.80 ALDH1A1 (0.60) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL825353 0.79 ALDH1A1 (0.49) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL825487 0.78 ALDH1A1 (0.48) ALDH1A1TSHRMEN1KMT2ASMN1; SMN2
SCHEMBL825406 0.78 ALDH1A1 (0.48) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL825598 0.78 ALDH1A1 (0.54) ALDH1A1TSHRTDP1MEN1KMT2A
SCHEMBL12587683 0.78 ALDH1A1 (0.57) ALDH1A1TSHRTDP1MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed