SCHEMBL825353

SCHEMBL825353

CCC(C)c1ccc(OCOc2ccc3ccccc3c2)cc1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.49
TSHR P16473 1/20 0.49
AGXT P21549 2/20 0.46
RAB9A P51151 2/20 0.46
NPC1 O15118 1/20 0.46
TDP1 Q9NUW8 3/20 0.45
MAPK1 P28482 2/20 0.45
KDM4E B2RXH2 1/20 0.45
ALOX5 P09917 1/20 0.44
TP53 P04637 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43
AKR1C3 P42330 1/20 0.42
AKR1C2 P52895 1/20 0.42
UGT2B7 P16662 1/20 0.42
CYP1A2 P05177 1/20 0.42
CYP2A6 P11509 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
PTPN7 P35236 1/20 0.41
GAA P10253 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11999045 0.89 AKR1C3 (0.48) ALDH1A1TSHRRAB9ANPC1ALOX5
SCHEMBL825656 0.88 ABCB11 (0.51) ALDH1A1TSHRRAB9AALOX5SMN1; SMN2
SCHEMBL825663 0.85 ALDH1A1 (0.48) ALDH1A1TSHRRAB9ANPC1TDP1
SCHEMBL825494 0.85 ALDH1A1 (0.60) ALDH1A1TSHRRAB9ANPC1TDP1
SCHEMBL14866949 0.85 ALOX5 (0.61) ALDH1A1TSHRAGXTRAB9ANPC1
SCHEMBL11113379 0.85 ALDH1A1 (0.62) ALDH1A1TSHRRAB9ANPC1TDP1
SCHEMBL14118314 0.82 SLC6A2 (0.46) ALDH1A1TSHRRAB9ANPC1TDP1
SCHEMBL13683034 0.82 ALDH1A1 (0.44) ALDH1A1TSHRRAB9ANPC1TDP1
SCHEMBL825545 0.82 ALDH1A1 (0.45) ALDH1A1TSHRRAB9ANPC1TDP1
SCHEMBL14118572 0.82 RAB9A (0.55) ALDH1A1TSHRRAB9ANPC1ALOX5

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8735048-B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method FUJIFILM CORPORATION (JP) 2014-05-27 US disclosed
US-20120301817-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE COMPOSITION AND PATTERN FORMING METHOD FUJIFILM CORPORATION (JP) 2012-11-29 US disclosed
US-8142977-B2 mixture of resin which decomposes under acid under exposure to actinic radiation, acid generator FUJIFILM CORPORATION (JP) 2012-03-27 US disclosed
US-7592118-B2 Addition polymer ; insoluble in alkali developer ; acid generator; microlithography, resolution sensitivity, accuracy pattern profile FUJIFILM CORPORATION (JP) 2009-09-22 US disclosed
US-20080241749-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed
US-20080241743-A1 POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME FUJIFILM CORPORATION (JP) 2008-10-02 US disclosed