SCHEMBL8318477

SCHEMBL8318477

O=C(Nc1ccccc1)NS(=O)(=O)S(=O)(=O)NC(=O)Nc1ccccc1

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ACP1 P24666 2/20 0.74
SMN1; SMN2 Q16637 3/20 0.67
TP53 P04637 1/20 0.67
EPHX1 P07099 1/20 0.67
TSHR P16473 1/20 0.67
EPHX2 P34913 1/20 0.67
CDK9 P50750 1/20 0.67
CLK4 Q9HAZ1 1/20 0.67
LMNA P02545 1/20 0.59
CASP3 P42574 1/20 0.57
SENP7 Q9BQF6 1/20 0.57
CA12 O43570 3/20 0.56
CA1 P00915 3/20 0.56
CA2 P00918 3/20 0.56
CA9 Q16790 3/20 0.56
MAOA P21397 2/20 0.55
MAOB P27338 2/20 0.55
CYP2C9 P11712 1/20 0.54
TAAR1 Q96RJ0 3/20 0.53
NPC1 O15118 3/20 0.53

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL24713108 0.83 ACP1 (0.69) ACP1SMN1; SMN2TP53EPHX1TSHR
SCHEMBL4202296 0.83 ACP1 (0.69) ACP1SMN1; SMN2TP53EPHX1TSHR
SCHEMBL27832586 0.83 ACP1 (0.69) ACP1SMN1; SMN2TP53EPHX1TSHR
SCHEMBL31395420 0.83 ACP1 (0.69) ACP1SMN1; SMN2TP53EPHX1TSHR
SCHEMBL4421237 0.83 ACP1 (0.69) ACP1SMN1; SMN2TP53EPHX1TSHR
SCHEMBL4196236 0.82 LMNA (0.78) ACP1SMN1; SMN2TP53EPHX1TSHR
SCHEMBL19971753 0.82 ACP1 (0.67) ACP1SMN1; SMN2TP53EPHX1TSHR
Diphenylurea SCHEMBL133103 0.81 SMN1; SMN2 (1.00) ACP1SMN1; SMN2TP53EPHX1TSHR
Diphenylurea SCHEMBL28392913 0.80 SMN1; SMN2 (0.77) ACP1SMN1; SMN2TP53EPHX1TSHR
Diphenylurea SCHEMBL11884167 0.80 SMN1; SMN2 (0.77) ACP1SMN1; SMN2TP53EPHX1TSHR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0584795-B1 Electrophotographic developing agent and method of manufacturing the same TOSHIBA KK (JP) 1999-03-10 EP disclosed