Predicted protein targets (top 19)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC6A4 | P31645 | 9/20 | 0.47 |
| ▸ | MAOA | P21397 | 2/20 | 0.47 |
| ▸ | GSK3B | P49841 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 2/20 | 0.36 |
| ▸ | NPC1 | O15118 | 1/20 | 0.36 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | IDO1 | P14902 | 1/20 | 0.33 |
| ▸ | TAS1R3 | Q7RTX0 | 1/20 | 0.33 |
| ▸ | TAS1R1 | Q7RTX1 | 1/20 | 0.33 |
| ▸ | GRK6 | P43250 | 1/20 | 0.33 |
| ▸ | SLC2A1 | P11166 | 1/20 | 0.32 |
| ▸ | CA12 | O43570 | 1/20 | 0.32 |
| ▸ | CA1 | P00915 | 1/20 | 0.32 |
| ▸ | CA2 | P00918 | 1/20 | 0.32 |
| ▸ | CA7 | P43166 | 1/20 | 0.32 |
| ▸ | CA13 | Q8N1Q1 | 1/20 | 0.32 |
| ▸ | MAOB | P27338 | 1/20 | 0.31 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10525886 | 0.93 | SLC6A4 (0.43) | SLC6A4MAOAGSK3BRAB9ANPC1 | |
| SCHEMBL3947933 | 0.89 | CA2 (0.41) | SLC6A4MAOARAB9ANPC1CA2 | |
| SCHEMBL22068903 | 0.87 | ALDH1A1 (0.44) | SLC6A4MAOAGSK3BRAB9ANPC1 | |
| SCHEMBL346860 | 0.86 | SLC6A4 (0.56) | SLC6A4MAOAGSK3BRAB9ANPC1 | |
| SCHEMBL14139449 | 0.84 | GSK3B (0.41) | SLC6A4MAOAGSK3BRAB9ANPC1 | |
| SCHEMBL22068902 | 0.82 | ALDH1A1 (0.41) | SLC6A4MAOARAB9ANPC1ALDH1A1 | |
| SCHEMBL5609306 | 0.79 | SLC6A4 (0.47) | SLC6A4MAOAGSK3BRAB9ANPC1 | |
| SCHEMBL10532807 | 0.78 | SLC2A1 (0.46) | SLC6A4MAOARAB9ANPC1SLC2A1 | |
| SCHEMBL10316183 | 0.78 | SLC6A4 (0.50) | SLC6A4MAOAGSK3BRAB9ANPC1 | |
| SCHEMBL9793575 | 0.78 | SLC6A4 (0.50) | SLC6A4MAOAGSK3BRAB9ANPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 59 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250189895-A1 | METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-06-12 | — | — | US | disclosed |
| US-20250172872-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE COMPOSITION, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2025-05-29 | — | — | US | disclosed |
| CN-119620544-A | Photosensitive resin composition, dry film, photosensitive dry film, resist film, molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2025-03-14 | — | — | CN | disclosed |
| CN-118829948-A | Method for manufacturing plating shaped article | 东京应化工业株式会社 | 2024-10-22 | — | — | CN | disclosed |
| CN-118742854-A | Chemically amplified positive photosensitive composition, method for producing molded substrate with mold, and method for producing plated molded article | 东京应化工业株式会社 | 2024-10-01 | — | — | CN | disclosed |
| US-20240053680-A1 | PHOTOSENSITIVE DRY FILM, LAMINATED FILM, METHOD FOR PRODUCING LAMINATED FILM, AND METHOD FOR PRODUCING PATTERNED RESIST FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2024-02-15 | — | — | US | disclosed |
| CN-110647010-B | Resin composition, dry film, method for producing dry film, resist film, substrate, and method for producing plating molded article | 东京应化工业株式会社 | 2024-02-09 | — | — | CN | disclosed |
| US-11803122-B2 | Chemical amplification-type photosensitive composition, photosensitive dry film, production method of patterned resist layer, production method of plated molded article, compound, and production method of compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-10-31 | — | — | US | disclosed |
| US-11754926-B2 | Method of forming resist pattern, resist composition and method of producing the same | TOKYO OHKA KOGYO CO., LTD. (JP) | 2023-09-12 | — | — | US | disclosed |
| WO-2023162551-A1 | METHOD FOR PRODUCING PLATED SHAPED ARTICLE | 東京応化工業株式会社 | 2023-08-31 | — | — | WO | disclosed |
| US-20170309468-A1 | CLEANING SOLUTION, METHOD OF REMOVING A REMOVAL TARGET AND METHOD OF ETCHING A SUBSTRATE USING SAID CLEANING SOLUTION | TOKYO OHKA KOGYO CO LTD (JP) | 2017-10-26 | — | — | US | disclosed |
| US-20160208201-A1 | CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING | TOKYO OHKA KOGYO CO LTD (JP) | 2016-07-21 | — | — | US | disclosed |
| US-9250534-B2 | Nonaqueous cleaning liquid and method for etching processing of silicon substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-02-02 | — | — | US | disclosed |
| US-8802610-B2 | Cleaning liquid and anticorrosive agent comprising a mercapto compound and solvent | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-08-12 | — | — | US | disclosed |
| US-20140018281-A1 | CLEANING LIQUID AND ANTICORROSIVE AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-16 | — | — | US | disclosed |
| US-20140017902-A1 | NONAQUEOUS CLEANING LIQUID AND METHOD FOR ETCHING PROCESSING OF SILICON SUBSTRATE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2014-01-16 | — | — | US | disclosed |
| US-20130330927-A1 | CLEANING LIQUID FOR LITHOGRAPHY AND METHOD FOR FORMING WIRING | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-12-12 | — | — | US | disclosed |
| US-20130172224-A1 | CLEANING LIQUID, AND ANTICORROSIVE AGENT | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-07-04 | — | — | US | disclosed |
| EP-0889718-A1 | KERATIN FIBRE DYE COMPOSITIONS CONTAINING PYRROLO-AZOLE COMPOUNDS, USE THEREOF AS COUPLERS, AND DYEING METHOD | L'OREAL (FR) | 1999-01-13 | — | — | EP | disclosed |
| WO-1997035554-A1 | KERATIN FIBRE DYE COMPOSITIONS CONTAINING PYRROLO-AZOLE COMPOUNDS, USE THEREOF AS COUPLERS, AND DYEING METHOD | L'OREAL (FR) | 1997-10-02 | — | — | WO | disclosed |