Known targets — ChEMBL curated mechanism
The experimentally established mechanism targets of Diethylamine. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPT | P10636 | 4/20 | 0.55 |
| ▸ | RAB9A | P51151 | 3/20 | 0.55 |
| ▸ | HTT | P42858 | 3/20 | 0.55 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.55 |
| ▸ | MITF | O75030 | 2/20 | 0.55 |
| ▸ | LMNA | P02545 | 2/20 | 0.55 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.55 |
| ▸ | MEN1 | O00255 | 3/20 | 0.55 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.55 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.55 |
| ▸ | MDM2 | Q00987 | 1/20 | 0.55 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.55 |
| ▸ | ACHE | P22303 | 5/20 | 0.53 |
| ▸ | PTGS2 | P35354 | 1/20 | 0.53 |
| ▸ | BCHE | P06276 | 1/20 | 0.51 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.50 |
| ▸ | IKBKB | O14920 | 1/20 | 0.49 |
| ▸ | RAF1 | P04049 | 1/20 | 0.49 |
| ▸ | RPS6KB1 | P23443 | 1/20 | 0.49 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9305014 | 0.89 | MAPT (0.66) | MAPTRAB9AHTTSMN1; SMN2MITF | |
| SCHEMBL9305010 | 0.89 | MAPT (0.66) | MAPTRAB9AHTTSMN1; SMN2MITF | |
| SCHEMBL22822883 | 0.89 | MAPT (0.66) | MAPTRAB9AHTTSMN1; SMN2MITF | |
| Dimethylamine SCHEMBL8372694 | 0.87 | MAPT (0.60) | MAPTRAB9AHTTSMN1; SMN2MITF | |
| Diethylamine SCHEMBL8377307 | 0.87 | MAPT (0.55) | MAPTRAB9AHTTSMN1; SMN2MITF | |
| Diethylamine SCHEMBL8780601 | 0.85 | ALDH1A1 (0.52) | MAPTRAB9AHTTSMN1; SMN2MITF | |
| Diethylamine SCHEMBL5688882 | 0.84 | CYP1A2 (0.72) | MAPTRAB9AHTTLMNAKMT2A | |
| Diethylamine SCHEMBL8376249 | 0.84 | CARM1 (0.58) | MAPTRAB9AHTTSMN1; SMN2MITF | |
| Diethylamine SCHEMBL8780592 | 0.83 | ALDH1A1 (0.64) | MAPTRAB9AMITFLMNAKMT2A | |
| Diethylamine SCHEMBL8780594 | 0.83 | ACHE (0.67) | MAPTRAB9AHTTSMN1; SMN2LMNA |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0551697-B1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO LTD (JP) | 1997-05-14 | — | — | EP | claimed |
| EP-0551697-A1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO., LTD. (JP) | 1993-07-21 | — | — | EP | claimed |
| US-5034429-A | An unsaturated monomer, a photoinitiator and a benzene derivative for providing a cured film | HITACHI CHEMICAL CO., LTD. (JP) | 1991-07-23 | — | — | US | claimed |
| EP-0636939-B1 | Photoinitiator compositions and photosensitive materials using the same | HITACHI CHEMICAL CO LTD (JP) | 1999-03-03 | — | — | EP | disclosed |
| US-5811218-A | IMPROVED PHOTOSENSITIVITY FOR MATERIALS CONTAINING POLYAMIC ACID AND ADDITION POLYMERIZABLE COMPOUND USED FOR PATTERN FORMATION | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1998-09-22 | — | — | US | disclosed |
| EP-0551697-B1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO LTD (JP) | 1997-05-14 | — | — | EP | disclosed |
| EP-0636939-A2 | Photoinitiator compositions and photosensitive materials using the same | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1995-02-01 | — | — | EP | disclosed |
| EP-0551697-A1 | Photoinitiator system and photopolymerizable composition using the same | HITACHI CHEMICAL CO., LTD. (JP) | 1993-07-21 | — | — | EP | disclosed |
| EP-0295044-B1 | PHOTOINITIATOR AND PHOTOPOLYMERIZABLE COMPOSITION USING THE SAME | Hitachi Chemical Co., Ltd. (JP) | 1992-04-22 | — | — | EP | disclosed |
| US-4987057-A | HIGH SENSITIVITY TO VISIBLE LIGHT RAYS | HITACHI CHEMICAL CO., LTD. (JP) | 1991-01-22 | — | — | US | disclosed |
| EP-0295044-A2 | Photoinitiator and photopolymerizable composition using the same | Hitachi Chemical Co., Ltd. (JP) | 1988-12-14 | — | — | EP | disclosed |