SCHEMBL8520162

SCHEMBL8520162

N#Cc1ccc(OS(=O)(=O)c2ccc3ccccc3c2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 3/20 0.54
TDP1 Q9NUW8 3/20 0.54
LMNA P02545 2/20 0.54
HTT P42858 1/20 0.54
SMN1; SMN2 Q16637 1/20 0.54
GAA P10253 1/20 0.54
MAPK1 P28482 1/20 0.54
CA1 P00915 2/20 0.50
CA2 P00918 2/20 0.50
CA9 Q16790 2/20 0.50
KAT6A Q92794 1/20 0.48
KDM4E B2RXH2 2/20 0.47
MEN1 O00255 2/20 0.46
KMT2A Q03164 2/20 0.46
NPC1 O15118 1/20 0.46
RAB9A P51151 1/20 0.46
ALDH1A1 P00352 1/20 0.44
MAPT P10636 1/20 0.44
ENPP3 O14638 2/20 0.44
ENPP1 P22413 2/20 0.44

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30626034 0.82 CA1 (0.53) L3MBTL1TDP1LMNAHTTSMN1; SMN2
SCHEMBL28296929 0.82 L3MBTL1 (0.75) L3MBTL1TDP1LMNAHTTSMN1; SMN2
SCHEMBL2473745 0.82 L3MBTL1 (0.60) L3MBTL1TDP1LMNAHTTSMN1; SMN2
SCHEMBL2064679 0.81 L3MBTL1 (0.59) L3MBTL1TDP1LMNAHTTSMN1; SMN2
SCHEMBL2064683 0.80 L3MBTL1 (0.58) L3MBTL1TDP1LMNAHTTSMN1; SMN2
SCHEMBL22558337 0.80 L3MBTL1 (0.62) L3MBTL1TDP1LMNAHTTSMN1; SMN2
SCHEMBL2233407 0.79 TDP1 (0.54) L3MBTL1TDP1LMNAHTTSMN1; SMN2
SCHEMBL22558332 0.76 CA2 (0.54) LMNAHTTSMN1; SMN2CA1CA2
SCHEMBL22180851 0.76 CA1 (0.54) L3MBTL1TDP1GAAMAPK1CA1
SCHEMBL2234029 0.76 CA2 (0.54) LMNAHTTSMN1; SMN2CA1CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0519299-B1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith CLARIANT GMBH (DE) 1999-08-11 EP disclosed
EP-0519298-B1 Radiation-sensitive sulfonic acid esters and their use HOECHST AG (DE) 1995-09-13 EP disclosed
US-5442061-A Recording, photoresists, printing plates HOECHST AKTIENGESELLSCHAFT (DE) 1995-08-15 US disclosed
US-5364734-A Sulfonated triazines HOECHST AKTIENGESELLSCHAFT (DE) 1994-11-15 US disclosed
US-5298364-A Negative photoresists, acid crosslinking HOECHST AKTIENGESELLSCHAFT (DE) 1994-03-29 US disclosed
EP-0519298-A1 Radiation-sensitive sulfonic acid esters and their use HOECHST AKTIENGESELLSCHAFT (DE) 1992-12-23 EP disclosed
EP-0519299-A1 Positive-working radiation-sensitive composition and radiation-sensitive recording material produced therewith HOECHST AKTIENGESELLSCHAFT (DE) 1992-12-23 EP disclosed