SCHEMBL8526770

SCHEMBL8526770

CC(C)(C)c1ccc2ccccc2c1OC(=O)Oc1c(C(C)(C)C)ccc2ccccc12

nearest known ligand 0.54

Predicted protein targets (top 17)

geneUniProtsupporting neighboursconfidence
KCNJ11 Q14654 4/20 0.42
ABCC9 O60706 3/20 0.42
ABCC8 Q09428 3/20 0.42
KCNJ8 Q15842 3/20 0.42
ALDH1A1 P00352 2/20 0.41
HSD17B10 Q99714 2/20 0.41
KDM4E B2RXH2 1/20 0.41
NCEH1 Q6PIU2 6/20 0.39
LMNA P02545 2/20 0.39
HPGD P15428 1/20 0.38
PGR P06401 1/20 0.38
GAA P10253 1/20 0.38
PTGS1 P23219 1/20 0.38
MAPK1 P28482 1/20 0.38
CYP1A1 P04798 1/20 0.38
CYP1B1 Q16678 1/20 0.38
HSD17B2 P37059 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8526776 0.89 HSD17B10 (0.43) KCNJ11ABCC9ABCC8KCNJ8ALDH1A1
SCHEMBL8037393 0.80 HSD17B10 (0.42) KCNJ11ABCC9ABCC8KCNJ8ALDH1A1
SCHEMBL26522382 0.79 ALDH1A1 (0.46) ALDH1A1HSD17B10KDM4ELMNAHPGD
SCHEMBL2977526 0.76 CA2 (0.48) ALDH1A1GAA
SCHEMBL20110931 0.75 LMNA (0.39) KCNJ11ABCC9ABCC8KCNJ8HSD17B10
SCHEMBL269051 0.74 CYP2A6 (0.48) ALDH1A1HSD17B10KDM4ENCEH1LMNA
SCHEMBL8528373 0.73 NCEH1 (0.45) ALDH1A1HSD17B10KDM4ENCEH1LMNA
SCHEMBL974719 0.72 HSD17B10 (0.53) KCNJ11ABCC9ABCC8KCNJ8ALDH1A1
SCHEMBL8060132 0.72 ALDH1A1 (0.52) ALDH1A1HSD17B10KDM4EHPGDGAA
SCHEMBL2080934 0.72 ALDH1A1 (0.43) KCNJ11ABCC9ABCC8KCNJ8ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0249139-B2 Resist compositions and use MICROSI INC (US) 1998-03-11 EP disclosed
US-5362607-A Photo-patternable in absence of moisture; treating substrate with positive resist composition, baking, irradiating resist in patterned way, heating, developing; resist of water-soluble phenolic resin, tertiary butyl compound, aryl onium salt MICROSI, INC. (US) 1994-11-08 US disclosed
US-5310619-A Resist compositions comprising a phenolic resin, an acid forming onium salt and a tert-butyl ester or tert-butyl carbonate which is acid-cleavable MICROSI, INC. (US) 1994-05-10 US disclosed
EP-0249139-A2 Resist compositions and use MicroSi, Inc. (a Delaware corporation) (US) 1987-12-16 EP disclosed