Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.37 |
| ▸ | LMNA | P02545 | 1/20 | 0.37 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.37 |
| ▸ | MMP1 | P03956 | 1/20 | 0.32 |
| ▸ | MMP7 | P09237 | 1/20 | 0.32 |
| ▸ | MMP12 | P39900 | 1/20 | 0.32 |
| ▸ | ECE1 | P42892 | 1/20 | 0.32 |
| ▸ | MMP13 | P45452 | 1/20 | 0.32 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.32 |
| ▸ | EPHX1 | P07099 | 3/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4742233 | 0.77 | — | — | |
| SCHEMBL21753714 | 0.75 | MMP1 (0.32) | MMP1MMP7MMP12ECE1MMP13 | |
| SCHEMBL6406451 | 0.75 | POLB (0.40) | ALDH1A1LMNAMMP1MMP7MMP12 | |
| SCHEMBL10982764 | 0.75 | MMP1 (0.32) | MMP1MMP7MMP12ECE1MMP13 | |
| SCHEMBL21455429 | 0.74 | ALDH1A1 (0.34) | ALDH1A1MMP1MMP7MMP12ECE1 | |
| SCHEMBL22333370 | 0.74 | ALDH1A1 (0.34) | ALDH1A1MMP1MMP7MMP12ECE1 | |
| SCHEMBL11480211 | 0.74 | ALDH1A1 (0.34) | ALDH1A1MMP1MMP7MMP12ECE1 | |
| SCHEMBL3311509 | 0.72 | LMNA (0.35) | LMNAMMP1MMP7MMP12ECE1 | |
| SCHEMBL7160160 | 0.72 | HSD11B1 (0.32) | SMN1; SMN2ALDH1A1LMNAHSD11B1 | |
| SCHEMBL778401 | 0.69 | MMP1 (0.35) | ALDH1A1MMP1MMP7MMP12ECE1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0520642-B1 | Resist material and pattern formation process | WAKO PURE CHEM IND LTD (JP) | 1998-10-28 | — | — | EP | disclosed |
| US-5670299-A | COATING A PHOTORESISTS POLYMER ON A SUBSTRATE, DEVELOPMENT AND HEAT TREATMENT | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1997-09-23 | — | — | US | disclosed |
| US-5468589-A | Heat resistant, photosensitive patterns | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1995-11-21 | — | — | US | disclosed |
| EP-0520642-A1 | Resist material and pattern formation process | WAKO PURE CHEMICAL INDUSTRIES LTD (JP) | 1992-12-30 | — | — | EP | disclosed |