SCHEMBL8549784

SCHEMBL8549784

C=C(CCNC(=O)Nc1ccc(P(=O)(O)O)cc1)C(=O)O

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
S1PR1 P21453 1/20 0.40
HDAC1 Q13547 1/20 0.39
HDAC2 Q92769 1/20 0.39
CNR1 P21554 4/20 0.39
NPC1 O15118 1/20 0.39
RAB9A P51151 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
EPHX1 P07099 5/20 0.38
KDM4E B2RXH2 1/20 0.38
CASR P41180 3/20 0.38
LMNA P02545 1/20 0.38
ALDH1A1 P00352 2/20 0.38
HTT P42858 1/20 0.38
CYP1A2 P05177 1/20 0.37
CYP3A4 P08684 1/20 0.37
CYP2C9 P11712 1/20 0.37
CYP2C19 P33261 1/20 0.37
CA2 P00918 1/20 0.37
CA4 P22748 1/20 0.37
CA5A P35218 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8549984 0.92 EPHX1 (0.43) S1PR1HDAC1HDAC2CNR1EPHX1
SCHEMBL5682291 0.82 MAOA (0.50) S1PR1CNR1NPC1RAB9ASMN1; SMN2
SCHEMBL2314772 0.82 EPHX1 (0.55) HDAC1HDAC2CNR1NPC1RAB9A
SCHEMBL8550324 0.81 ALDH1A1 (0.56) S1PR1CNR1NPC1RAB9ASMN1; SMN2
SCHEMBL28804222 0.78 CA2 (0.42) NPC1RAB9ASMN1; SMN2EPHX1LMNA
SCHEMBL8545908 0.78 CA2 (0.47) KDM4ELMNAALDH1A1CA2CA4
SCHEMBL7094785 0.77 CA2 (0.62) KDM4EALDH1A1CA2CA4CA5A
SCHEMBL8549979 0.75 CNR1 (0.42) HDAC1HDAC2CNR1NPC1RAB9A
SCHEMBL8549987 0.75 CNR1 (0.42) HDAC1HDAC2CNR1NPC1RAB9A
SCHEMBL4942260 0.74 MAOA (0.47) S1PR1HDAC1CNR1EPHX1KDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed