SCHEMBL8550324

SCHEMBL8550324

C=C(CCNC(=O)Nc1ccc(C)cc1)C(=O)O

nearest known ligand 0.56

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.56
CASR P41180 1/20 0.56
CYP1A2 P05177 1/20 0.56
CYP3A4 P08684 1/20 0.56
CYP2C9 P11712 1/20 0.56
CYP2C19 P33261 1/20 0.56
NPC1 O15118 5/20 0.54
CNR1 P21554 3/20 0.52
RAB9A P51151 4/20 0.50
SMN1; SMN2 Q16637 4/20 0.50
TP53 P04637 2/20 0.50
MEN1 O00255 1/20 0.50
HPGD P15428 1/20 0.50
KMT2A Q03164 1/20 0.50
SLC6A3 Q01959 1/20 0.49
CA12 O43570 1/20 0.46
CA1 P00915 1/20 0.46
CA2 P00918 1/20 0.46
CA4 P22748 1/20 0.46
CA7 P43166 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8550840 0.91 ALDH1A1 (0.60) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL5682291 0.86 MAOA (0.50) ALDH1A1CASRCYP3A4NPC1CNR1
SCHEMBL2314772 0.86 EPHX1 (0.55) ALDH1A1CASRNPC1CNR1RAB9A
SCHEMBL7099121 0.82 ALDH1A1 (0.51) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL8549784 0.81 S1PR1 (0.40) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL8545908 0.81 CA2 (0.47) ALDH1A1CA12CA1CA2CA4
SCHEMBL7094785 0.80 CA2 (0.62) ALDH1A1KMT2ACA12CA1CA2
SCHEMBL7419897 0.80 HDAC1 (0.66) ALDH1A1CASRCYP1A2CYP3A4CYP2C9
SCHEMBL7097167 0.79 GAA (0.52) NPC1RAB9ASMN1; SMN2TP53MEN1
SCHEMBL4942260 0.78 MAOA (0.47) ALDH1A1CYP1A2CYP3A4CYP2C9CYP2C19

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5731127-A WEAR RESISTANCE, SOLVENT RESISTANCE DAINIPPON INK AND CHEMICALS, INC. (JP) 1998-03-24 US disclosed
EP-0737896-A2 Photosensitive composition and photosensitive planographic printing plate DAINIPPON INK AND CHEMICALS, INC. (JP) 1996-10-16 EP disclosed