SCHEMBL874104

SCHEMBL874104

CNc1ccc(C(=O)c2ccc(NC)cc2)cc1.O=C(c1ccc(Cl)cc1)c1ccc(Cl)cc1

nearest known ligand 0.57

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
SRD5A2 P31213 1/20 0.57
MAPK1 P28482 1/20 0.57
PTGS2 P35354 4/20 0.55
HPGD P15428 1/20 0.55
ALDH1A1 P00352 3/20 0.52
NPC1 O15118 5/20 0.52
RAB9A P51151 3/20 0.52
SMN1; SMN2 Q16637 3/20 0.52
MEN1 O00255 1/20 0.52
MAPT P10636 1/20 0.52
HTT P42858 1/20 0.52
KMT2A Q03164 1/20 0.52
NLRP1 Q9C000 1/20 0.52
PRNP P04156 1/20 0.50
NR4A1 P22736 1/20 0.48
CES2 O00748 1/20 0.48
CES1 P23141 1/20 0.48
LMNA P02545 1/20 0.47
POLB P06746 1/20 0.47
GAA P10253 1/20 0.47

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL52136 0.89 ALDH1A1 (0.52) SRD5A2HPGDALDH1A1NPC1RAB9A
SCHEMBL21698103 0.82 NPC1 (0.70) MAPK1ALDH1A1NPC1RAB9ASMN1; SMN2
SCHEMBL228690 0.82
SCHEMBL9065412 0.82 SRD5A2 (0.80) SRD5A2MAPK1HPGDALDH1A1MAPT
SCHEMBL51827 0.82 SRD5A2 (0.80) SRD5A2MAPK1HPGDALDH1A1MAPT
SCHEMBL10697158 0.82 SRD5A2 (0.80) SRD5A2MAPK1HPGDALDH1A1MAPT
SCHEMBL1681512 0.82 SRD5A2 (0.80) SRD5A2MAPK1HPGDALDH1A1MAPT
SCHEMBL8666599 0.81 MAPK13 (0.67) SRD5A2HPGDALDH1A1NPC1RAB9A
SCHEMBL25652847 0.81 ALDH1A1 (0.70) SRD5A2PTGS2ALDH1A1NPC1RAB9A
SCHEMBL15453792 0.81 SRD5A2 (0.59) SRD5A2MAPK1PTGS2HPGDALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20230122600-A1 PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE RESIN FILM PREPARED USING SAME, AND DISPLAY DEVICE SAMSUNG SDI CO., LTD. (KR) 2023-04-20 US disclosed
US-20210240077-A1 PHOTOSENSITIVE COMPOSITIONS, PREPARATION METHODS THEREOF, AND QUANTUM DOT POLYMER COMPOSITE PATTERN PRODUCED THEREFROM SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-08-05 US disclosed
US-10990006-B2 Photosensitive compositions, preparation methods thereof, and quantum dot polymer composite pattern produced therefrom SAMSUNG ELECTRONICS CO., LTD. (KR) 2021-04-27 US disclosed
US-20170176854-A1 PHOTOSENSITIVE COMPOSITIONS, PREPARATION METHODS THEREOF, AND QUANTUM DOT POLYMER COMPOSITE PATTERN PRODUCED THEREFROM SAMSUNG DISPLAY CO., LTD. (KR) 2017-06-22 US disclosed
US-8828282-B2 Photosensitive resin composition for color filter and color filter using the same CHEIL INDUSTRIES INC. (KR) 2014-09-09 US disclosed
US-8530537-B2 Black photosensitive resin composition and light blocking layer using the same CHEIL INDUSTRIES INC. (KR) 2013-09-10 US disclosed
WO-2013094827-A1 PHOTOSENSITIVE RESIN COMPOSITION FOR COLOR FILTER AND COLOR FILTER USING THE SAME CHEIL INDUSTRIES INC. (KR) 2013-06-27 WO disclosed
US-20120287524-A1 Novel Compound, Pigment Dispersion Composition and Photosensitive Resin Composition Including the Same, and Color Filter Using the Same CHEIL INDUSTRIES INC. (KR) 2012-11-15 US disclosed
US-8298454-B2 Photosensitive resin composition and light blocking layer using the same CHEIL INDUSTRIES INC. (KR) 2012-10-30 US disclosed
US-20120145971-A1 Photosensitive Resin Composition and Light Blocking Layer Using the Same CHEIL INDUSTRIES INC. (KR) 2012-06-14 US disclosed
US-20120077897-A1 Black Photosensitive Resin Composition and Light Blocking Layer Using the Same CHEIL INDUSTRIES INC. (KR) 2012-03-29 US disclosed
WO-2011074752-A1 NOVEL COMPOUND, PIGMENT DISPERSION COMPOSITION AND PHOTOSENSITIVE RESIN COMPOSITION INCLUDING THE SAME, AND COLOR FILTER USING THE SAME CHEIL INDUSTRIES INC. (KR) 2011-06-23 WO disclosed
EP-1095313-B1 PHOTOPOLYMERIZABLE THERMOSETTING RESIN COMPOSITIONS CIBA SC HOLDING AG (CH) 2008-03-05 EP disclosed
EP-1135219-B1 METHOD FOR PRODUCING ADHESIVE SURFACE COATINGS CIBA SC HOLDING AG (CH) 2004-01-28 EP disclosed
US-6485885-B1 Photopolymerizable thermosetting resin compositions CIBA SPECIALTY CHEMICALS CORPORATION 2002-11-26 US disclosed
EP-1135219-A1 METHOD FOR PRODUCING ADHESIVE SURFACE COATINGS Ciba SC Holding AG (CH) 2001-09-26 EP disclosed
WO-2000024527-A1 METHOD FOR PRODUCING ADHESIVE SURFACE COATINGS CIBA SPECIALTY CHEMICALS HOLDING INC. (CH) 2000-05-04 WO disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20120287524-A1 Novel Compound, Pigment Dispersion Composition and Photosensitive Resin Composition Including the Same, and Color Filter Using the Same SUN2, RB1, ATP6V0C SRD5A2 2473/4885MAPK1 4571/4885PTGS2 2336/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.