SCHEMBL52136

SCHEMBL52136

CNc1ccc(C(=O)c2ccc(NC)cc2)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 8/20 0.52
LMNA P02545 3/20 0.52
MAPK13 O15264 1/20 0.52
MAPK12 P53778 1/20 0.52
MAPK11 Q15759 1/20 0.52
MAPK14 Q16539 1/20 0.52
L3MBTL1 Q9Y468 1/20 0.52
RAB9A P51151 3/20 0.48
MEN1 O00255 1/20 0.48
NPC1 O15118 1/20 0.48
KMT2A Q03164 1/20 0.48
HPGD P15428 6/20 0.48
RECQL P46063 2/20 0.48
HSD17B10 Q99714 2/20 0.48
TP53 P04637 1/20 0.48
CYP3A4 P08684 1/20 0.48
THRB P10828 1/20 0.48
ALOX15 P16050 1/20 0.48
CASP1 P29466 1/20 0.48
HIF1A Q16665 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL25652847 0.91 ALDH1A1 (0.70) ALDH1A1LMNARAB9ANPC1MAPT
SCHEMBL8666599 0.91 MAPK13 (0.67) ALDH1A1LMNAMAPK13MAPK12MAPK11
SCHEMBL874104 0.89 SRD5A2 (0.57) ALDH1A1LMNARAB9AMEN1NPC1
SCHEMBL24627774 0.85 MAPT (0.73) ALDH1A1LMNARAB9AMEN1NPC1
SCHEMBL11743744 0.85 ALDH1A1 (0.42) ALDH1A1LMNAMAPK13MAPK12MAPK11
SCHEMBL9188595 0.85 RAB9A (0.61) ALDH1A1LMNARAB9AMEN1NPC1
SCHEMBL4140392 0.84 CES2 (0.52) ALDH1A1RAB9ANPC1HPGDRECQL
SCHEMBL9187483 0.84 APP (0.44) ALDH1A1LMNAMAPK13MAPK12MAPK11
SCHEMBL9187486 0.84 MAPK13 (0.44) ALDH1A1LMNAMAPK13MAPK12MAPK11
SCHEMBL9136891 0.82 ALDH1A1 (0.75) ALDH1A1LMNAL3MBTL1MEN1NPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 2543 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115678005-B Polymer, resin composition, resin film, semiconductor device, and light-emitting device 上海邃铸科技有限公司 2024-10-01 CN claimed
CN-115340784-B Solder resist ink with reflection performance, circuit board and display device 广州华星光电半导体显示技术有限公司 2023-08-01 CN claimed
CN-114044870-B Polyurethane chain extender and preparation method thereof, and cast polyurethane elastomer and preparation method thereof 万华化学集团股份有限公司 2023-05-26 CN claimed
CN-112723342-B Phosphorus-containing functionalized graphene and preparation method and application thereof 中国石油化工股份有限公司 2023-02-24 CN claimed
CN-115340784-A Solder resist ink with reflection performance, circuit board and display device 广州华星光电半导体显示技术有限公司 2022-11-15 CN claimed
CN-113198302-A SRR free radical cluster medicament for treating various VOCs (volatile organic compounds) foul waste gas 成都安捷芮环保科技有限公司 2021-08-03 CN claimed
CN-110317473-B Preparation method of photo-induced and thermochromic microcapsule 上海炬通实业有限公司 2021-04-09 CN claimed
CN-109880217-A A kind of green biodegradable plastics film and its processing technology 广州思薇伦特美容生物科技有限公司 2019-06-14 CN claimed
US-10005915-B2 High-stretch energy curable inks and method of use in heat transfer label applications SUN CHEMICAL CORPORATION (US) 2018-06-26 US claimed
EP-3257677-A1 INKS OR COATINGS AND METHOD OF USE IN HEAT TRANSFER LABEL APPLICATIONS Sun Chemical Corporation (US) 2017-12-20 EP claimed
US-5698611-A ACRYLATED ESTER GC CORPORATION (JP) 1997-12-16 US claimed
US-5153102-A Blend of acrylic copolymer, photopolymerizable monomer, melamine compound and free radical photoinitiator INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 1992-10-06 US claimed
US-4996132-A Heat-resistant photosensitive resin composition TOYKO OHKA KOGYO CO. LTD. (JP) 1991-02-26 US claimed
US-4994703-A Piezoelectric element of laminate type MITSUBISHI KASEI CORPORATION (JP) 1991-02-19 US claimed
US-4975471-A Photo-curable epoxy resin type composition KABUSHIKI KAISHA TOSHIBA (JP) 1990-12-04 US claimed
US-4826752-A Dry photosensitive lithographic plate comprising a silicon rubber layer containing an aromatic aminosilane FUJI PHOTO FILM CO., LTD. (JP) 1989-05-02 US claimed
EP-0280295-A2 A heat-resistant photosensitive resin composition TOKYO OHKA KOGYO CO., LTD. (JP) 1988-08-31 EP claimed
US-4626556-A LADDER POLYMERS JAPAN SYNTHETIC RUBBER CO., LTD. (JP) 1986-12-02 US claimed
US-4321319-A Photosensitive compositions containing polyamides acid with photosensitive groups HITACHI, LTD. (JP) 1982-03-23 US claimed
US-4180404-A Heat resistant photoresist composition and process for preparing the same ASAHI KASEI KOGYO KABUSHIKI KAISHA (JP) 1979-12-25 US claimed