SCHEMBL8744302

SCHEMBL8744302

O=[N+]([O-])c1cc([N+](=O)[O-])c(CO)c([N+](=O)[O-])c1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 7/20 0.53
GPR35 Q9HC97 6/20 0.53
KMT2A Q03164 5/20 0.53
MAPK1 P28482 4/20 0.53
MEN1 O00255 4/20 0.53
TDP1 Q9NUW8 4/20 0.53
MAPT P10636 3/20 0.53
HPGD P15428 2/20 0.53
CYP1A2 P05177 2/20 0.53
KDM4E B2RXH2 1/20 0.53
TTR P02766 1/20 0.53
CYP2C9 P11712 1/20 0.53
ALOX15 P16050 1/20 0.53
ALOX12 P18054 1/20 0.53
RECQL P46063 1/20 0.53
PMP22 Q01453 1/20 0.53
HIF1A Q16665 1/20 0.53
HSD17B10 Q99714 1/20 0.53
TSHR P16473 2/20 0.48
TP53 P04637 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL95482 0.83 ALDH1A1 (0.53) ALDH1A1GPR35KMT2AMAPK1MEN1
SCHEMBL8214082 0.83 ALDH1A1 (0.44) ALDH1A1GPR35MAPK1MAPTHPGD
SCHEMBL9318057 0.82 ALDH1A1 (0.59) ALDH1A1GPR35KMT2AMAPK1MEN1
SCHEMBL11774795 0.82 ALDH1A1 (0.52) ALDH1A1GPR35KMT2AMAPK1MEN1
SCHEMBL9098889 0.81 GPR35 (0.61) ALDH1A1GPR35KMT2AMAPK1MEN1
SCHEMBL1668404 0.80 HTT (0.51) ALDH1A1GPR35KMT2AMAPK1MEN1
SCHEMBL9292425 0.79 CYP1A2 (0.64) ALDH1A1GPR35KMT2AMAPK1MEN1
SCHEMBL7497845 0.78 ALDH1A1 (0.48) ALDH1A1GPR35KMT2AMAPK1MEN1
SCHEMBL11323967 0.78 GPR35 (0.50) ALDH1A1GPR35KMT2AMAPK1MEN1
SCHEMBL28252618 0.78 ALDH1A1 (0.52) ALDH1A1GPR35KMT2AMAPK1MEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 26 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20210380632-A1 METHOD FOR PRODUCING LONG-CHAIN PEPTIDE KANEKA CORPORATION (JP) 2021-12-09 US disclosed
EP-3778620-A1 METHOD FOR PRODUCING LONG-CHAIN PEPTIDE KANEKA CORPORATION (JP) 2021-02-17 EP disclosed
CN-111918872-A Method for producing long-chain peptide 株式会社钟化 2020-11-10 CN disclosed
WO-2019187469-A1 METHOD FOR PRODUCING LONG-CHAIN PEPTIDE 株式会社カネカ 2019-10-03 WO disclosed
CN-1142956-C Process for making graft polyols using t-amyl peroxy free radical initiator 2004-03-24 CN disclosed
CN-1347426-A Method for preparing graft polyols using tert-amyl peroxy free radical initiators BASF CORP (US) 2002-05-01 CN disclosed
EP-0155231-B2 Image-producing process CIBA GEIGY AG (CH) 1997-01-15 EP disclosed
US-5508141-A AQUEOUS ACIDIC PHOTORESIST EMULSION CONTAINING RESIN, POSITIVE-ACTING PHOTOACTIVE FUNCTIONALITY, ACID, OXIDIZING AGENT, SURFACTANT W. R. GRACE & CO.-CONN. (US) 1996-04-16 US disclosed
CN-1030739-C Method for selectively coating metal surface, method for forming circuit pattern from metal surface and photosensitive emulsion used therefor GRACE W R & CO (US) 1996-01-17 CN disclosed
EP-0468002-A4 AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES GRACE W R & CO (US) 1995-08-09 EP disclosed
US-5064746-A RADIATION-SENSITIVE MIXTURE FOR PHOTOSENSITIVE COATING MATERIALS AND THE PRODUCTION OF RELIEF PATTERNS AND RELIEF IMAGES BASF AKTIENGESELLSCHAFT (DE) 1991-11-12 US disclosed
CN-1054836-A Automatic deposition emulsion and the method for the metal surface being carried out selective protection with this emulsion GRACE W R & CO (US) 1991-09-25 CN disclosed
WO-1991008840-A1 AUTODEPOSITION EMULSION FOR SELECTIVELY PROTECTING METALLIC SURFACES W.R. GRACE & CO.-CONN. (US) 1991-06-27 WO disclosed
US-4822866-A PLASMA RESISTANT PHOTORESISTS; REMOVABLE WITH WEAK ALKALINE SOLUTIONS BASF AKTIENGESELLSCHAFT (DE) 1989-04-18 US disclosed
US-4812542-A PHOTORESISTS, LIGHT-SENSITIVE COATINGS BASF AKTIENGESELLSCHAFT (DE) 1989-03-14 US disclosed
US-4808682-A BLEND WITH OLEFINICALLY UNSATURATED SILICON COMPOUND BASF AKTIENGESELLSCHAFT (DE) 1989-02-28 US disclosed
EP-0277555-A2 Copolymers with 0-nitrocarbinol ester groups, and process for preparing two-layer resists and semiconductor devices BASF Aktiengesellschaft (DE) 1988-08-10 EP disclosed
EP-0271010-A2 Copolymers with 0-nitrocarbinol ester groups, and their use BASF Aktiengesellschaft (DE) 1988-06-15 EP disclosed
US-4632900-A Process for the production of images after electrodeposition of positive photoresist on electrically conductive surface CIBA-GEIGY CORPORATION (US) 1986-12-30 US disclosed
EP-0155231-A2 Image-producing process CIBA-GEIGY AG (CH) 1985-09-18 EP disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20210380632-A1 METHOD FOR PRODUCING LONG-CHAIN PEPTIDE VIP, PTMS, NGLY1 ALDH1A1 4732/4885GPR35 2385/4885KMT2A 4023/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.