Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HMGCR | P04035 | 6/20 | 0.47 |
| ▸ | CYP3A4 | P08684 | 6/20 | 0.47 |
| ▸ | LMNA | P02545 | 5/20 | 0.47 |
| ▸ | HIF1A | Q16665 | 4/20 | 0.47 |
| ▸ | TSHR | P16473 | 4/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.47 |
| ▸ | ABCB11 | O95342 | 3/20 | 0.47 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.47 |
| ▸ | ITGB2 | P05107 | 2/20 | 0.47 |
| ▸ | ICAM1 | P05362 | 2/20 | 0.47 |
| ▸ | PGR | P06401 | 2/20 | 0.47 |
| ▸ | ABCB1 | P08183 | 2/20 | 0.47 |
| ▸ | ADORA3 | P0DMS8 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | ADRB3 | P13945 | 2/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 2/20 | 0.47 |
| ▸ | ITGAL | P20701 | 2/20 | 0.47 |
| ▸ | TACR2 | P21452 | 2/20 | 0.47 |
| ▸ | TBXA2R | P21731 | 2/20 | 0.47 |
| ▸ | SLC6A2 | P23975 | 2/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12705141 | 0.80 | SMN1; SMN2 (0.36) | HMGCRCYP3A4LMNAHIF1ATSHR | |
| SCHEMBL18253536 | 0.79 | HMGCR (0.43) | HMGCRCYP3A4LMNAHIF1ATSHR | |
| SCHEMBL14159897 | 0.75 | PPARG (0.32) | HMGCRCYP3A4LMNAHIF1ATSHR | |
| SCHEMBL879226 | 0.73 | HMGCR (0.47) | HMGCRCYP3A4TSHRSMN1; SMN2ABCB11 | |
| SCHEMBL10163392 | 0.72 | HMGCR (0.37) | HMGCRCYP3A4LMNAHIF1ATSHR | |
| SCHEMBL879071 | 0.72 | LMNA (0.42) | HMGCRCYP3A4LMNAHIF1ATSHR | |
| SCHEMBL13779884 | 0.71 | HMGCR (0.34) | HMGCRCYP3A4LMNAHIF1ATSHR | |
| SCHEMBL786107 | 0.71 | PTPN1 (0.40) | HMGCRCYP3A4LMNAHIF1ATSHR | |
| SCHEMBL6743284 | 0.70 | GPX4 (0.40) | SMN1; SMN2KDM4EMAPTTDP1KMT2A | |
| SCHEMBL23963268 | 0.70 | PRKCA (0.44) | HMGCR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2296039-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2013-09-25 | — | — | EP | disclosed |
| EP-1273970-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2012-03-28 | — | — | EP | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7977029-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2011-07-12 | — | — | US | disclosed |
| US-7749678-B2 | contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure | FUJIFILM CORPORATION (JP) | 2010-07-06 | — | — | US | disclosed |
| US-7749678-B2 | contains sulfonium compound; improved line edge roughness and pattern profile, and contrast of sensitivity and dissolution in extreme ultraviolet exposure | FUJIFILM CORPORATION (JP) | 2010-07-06 | — | — | US | disclosed |
| EP-1296190-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-05-05 | — | — | EP | disclosed |
| US-7514201-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-7514201-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2009-04-07 | — | — | US | disclosed |
| US-20080318159-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2008-12-25 | — | — | US | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214465-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214733-B2 | Positive type resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7214733-B2 | Positive type resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-05-08 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7192681-B2 | Positive photosensitive composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-20 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7189492-B2 | Photosensitive composition and pattern forming method using the same | FUJI PHOTO FILM CO., LTD. (JP) | 2007-03-13 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |
| US-7179578-B2 | Positive resist composition | FUJI PHOTO FILM CO., LTD. (JP) | 2007-02-20 | — | — | US | disclosed |