Predicted protein targets (top 4)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 1/20 | 0.30 |
| ▸ | CA2 | P00918 | 1/20 | 0.30 |
| ▸ | LMNA | P02545 | 1/20 | 0.30 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14905847 | 0.86 | — | — | |
| SCHEMBL15219617 | 0.81 | MMP8 (0.33) | — | |
| SCHEMBL18643695 | 0.81 | — | — | |
| SCHEMBL13966977 | 0.81 | — | — | |
| SCHEMBL10228185 | 0.81 | MMP8 (0.33) | — | |
| SCHEMBL24952052 | 0.80 | ELANE (0.40) | CA1CA2LMNAHSD17B10 | |
| SCHEMBL10284999 | 0.80 | — | — | |
| SCHEMBL904347 | 0.77 | CA1 (0.31) | CA1CA2LMNAHSD17B10 | |
| SCHEMBL807038 | 0.76 | HTT (0.41) | CA1CA2LMNAHSD17B10 | |
| SCHEMBL21436393 | 0.76 | DGAT1 (0.43) | CA1CA2LMNAHSD17B10 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230217718-A1 | METHOD FOR PRODUCING LIGHT-EMITTING ELEMENTS | CENTRAL GLASS COMPANY, LIMITED (JP) | 2023-07-06 | — | — | US | disclosed |
| EP-2891014-B1 | PATTERN FORMING METHOD, AND ELECTRONIC DEVICE PRODUCING METHOD USING THE SAME | FUJIFILM CORP (JP) | 2017-11-29 | — | — | EP | disclosed |
| WO-2013100189-A1 | PATTERN FORMING METHOD, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2013-07-04 | — | — | WO | disclosed |
| EP-2434343-A1 | Resist composition, resist film therefrom and method of forming pattern therewith | Fujifilm Corporation (JP) | 2012-03-28 | — | — | EP | disclosed |