SCHEMBL904347

SCHEMBL904347

CCCC(C)(CC)C(=O)OC(C(F)(F)F)C(F)(F)F

nearest known ligand 0.31

Predicted protein targets (top 4)

geneUniProtsupporting neighboursconfidence
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
LMNA P02545 1/20 0.31
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21574561 0.90
SCHEMBL19135829 0.89 PRKCA (0.32) CA1CA2
SCHEMBL16705263 0.88
SCHEMBL22051424 0.82
SCHEMBL24952052 0.81 ELANE (0.40) CA1CA2LMNAHSD17B10
SCHEMBL22062026 0.81 MMP8 (0.36)
SCHEMBL10098429 0.79 LMNA (0.37) LMNAHSD17B10
SCHEMBL18591144 0.79 PRKCA (0.33)
SCHEMBL17832152 0.78 PRKCA (0.40)
SCHEMBL17832149 0.78 ALDH1A1 (0.32) LMNAHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2012043866-A1 ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC-RAY- OR RADIATION-SENSITIVE FILM AND METHOD OF FORMING PATTERN FUJIFILM CORPORATION (JP) 2012-04-05 WO disclosed
EP-1829850-A2 Fluoroalcohol preparation method, fluorinated monomer, polymer, resist composition and patterning process Shin-Etsu Chemical Co., Ltd. (JP) 2007-09-05 EP disclosed