SCHEMBL888080

SCHEMBL888080

C=CC(=O)OC(CCCCC)OC(=O)c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
THRB P10828 2/20 0.46
THRA P10827 1/20 0.46
MEN1 O00255 2/20 0.44
KMT2A Q03164 2/20 0.44
ALDH1A1 P00352 2/20 0.43
CTSK P43235 1/20 0.41
LMNA P02545 3/20 0.41
PRSS1 P07477 3/20 0.40
CTSG P08311 2/20 0.40
CTRB1 P17538 2/20 0.40
CMA1 P23946 2/20 0.40
CNR2 P34972 1/20 0.40
TSHR P16473 2/20 0.40
TP53 P04637 1/20 0.40
ALOX12 P18054 1/20 0.39
CES2 O00748 3/20 0.39
CES1 P23141 3/20 0.39
PDCD1 Q15116 1/20 0.39
CD274 Q9NZQ7 1/20 0.39
PRSS2 P07478 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9647798 0.96 MEN1 (0.45) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL9649938 0.91 LMNA (0.44) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL2007985 0.89 MEN1 (0.52) MEN1KMT2AALDH1A1CTSKLMNA
SCHEMBL10869201 0.89 THRB (0.41) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL10868641 0.88 THRB (0.43) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL10868855 0.88 THRB (0.43) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL10868715 0.88 THRB (0.43) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL10870169 0.88 THRB (0.43) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL10868369 0.88 THRB (0.43) THRBTHRAMEN1KMT2AALDH1A1
SCHEMBL29608632 0.87 ALDH1A1 (0.54) MEN1KMT2AALDH1A1CTSKLMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 24 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9012555-B2 UV-curable thermoformable dielectric for thermoformable circuits E I DU PONT DE NEMOURS AND COMPANY (US) 2015-04-21 US disclosed
US-20140350162-A1 UV-CURABLE THERMOFORMABLE DIELECTRIC FOR THERMOFORMABLE CIRCUITS E I DU PONT DE NEMOURS AND COMPANY (US) 2014-11-27 US disclosed
US-20140350161-A1 UV-CURABLE THERMOFORMABLE DIELECTRIC FOR THERMOFORMABLE CIRCUITS E I DU PONT DE NEMOURS AND COMPANY (US) 2014-11-27 US disclosed
EP-2571916-B1 UV-CURABLE POLYMER THICK FILM DIELECTRIC COMPOSITIONS WITH EXCELLENT ADHESION TO ITO DU PONT (US) 2014-09-17 EP disclosed
US-8329772-B2 UV-curable polymer thick film dielectric compositions with excellent adhesion to ITO E I DU PONT DE NEMOURS AND COMPANY (US) 2012-12-11 US disclosed
US-20110288197-A1 UV-CURABLE POLYMER THICK FILM DIELECTRIC COMPOSITIONS WITH EXCELLENT ADHESION TO ITO E. I. DU PONT DE NEMOURS AND COMPANY (US) 2011-11-24 US disclosed
EP-0264037-B1 UV-CURABLE DIELECTRIC COMPOSITIONS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1993-01-20 EP disclosed
EP-0313474-B1 AN OPTICAL ARTICLE EXHIBITING A HIGH LEVEL OF SECOND ORDER POLARIZATION SUSCEPTIBILITY EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1992-12-23 EP disclosed
EP-0313476-B1 AN OPTICAL ARTICLE CONTAINING A POLYMERIC MATRIX EXHIBITING A HIGH LEVEL OF SECOND ORDER POLARIZATION SUSCEPTIBILITY EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1992-12-23 EP disclosed
EP-0313475-B1 AN OPTICAL ARTICLE CONTAINING A TRANSMISSION MEDIUM EXHIBITING A HIGH LEVEL OF SECOND ORDER POLARIZATION SUSCEPTIBILITY EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1992-12-23 EP disclosed
EP-0313474-A2 An optical article exhibiting a high level of second order polarization susceptibility EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-04-26 EP disclosed
EP-0300203-A2 Photoresist composition comprising cyclohexyleneoxyalkyl acrylates EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1989-01-25 EP disclosed
US-4796971-A CHARGE TRANSFER COMPOUND ON CROSSLINKED MATRIX EASTMAN KODAK COMPANY (US) 1989-01-10 US disclosed
US-4792208-A POLAR ALIGNED NONCENTROSYMMETRIC MOLECULAR DIPOLES; SULFONYL MOIETY AS ELECTRON ACCEPTOR EASTMAN KODAK COMPANY (US) 1988-12-20 US disclosed
US-4771085-A TALC AND-OR MICA DISPERSED IN ACRYLATED RUBBER MODIFIED EPOXY RESIN OLIGOMER, ACRYLATED POLYDIENE OLIGOMER AND ALKYL ACRYLATE E. I. DU PONT DE NEMOURS AND COMPANY (US) 1988-09-13 US disclosed
EP-0264037-A2 UV-curable dielectric compositions E.I. DU PONT DE NEMOURS AND COMPANY (US) 1988-04-20 EP disclosed
EP-0129234-B1 ELECTROPHOTOGRAPHIC ELEMENTS HAVING BARRIER LAYERS OF CROSSLINKED POLYMERS EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1987-11-04 EP disclosed
EP-0129234-A1 Electrophotographic elements having barrier layers of crosslinked polymers EASTMAN KODAK COMPANY (a New Jersey corporation) (US) 1984-12-27 EP disclosed
US-4485161-A Electrophotographic elements having barrier layers of crosslinked polymers of aliphatic or aromatic monomers containing α,β-ethylenically unsaturated carbonyl-containing substituents EASTMAN KODAK COMPANY (US) 1984-11-27 US disclosed
US-4322490-A Photopolymerizable compositions featuring improved monomers EASTMAN KODAK COMPANY (US) 1982-03-30 US disclosed