SCHEMBL8897938

SCHEMBL8897938

CCC(Cc1ccccc1)(C(=O)c1ccc(SC)cc1)N(C)C

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TAS2R14 Q9NYV8 1/20 0.43
KMT2A Q03164 4/20 0.40
MEN1 O00255 2/20 0.40
ALDH1A1 P00352 4/20 0.40
LMNA P02545 3/20 0.40
MAPT P10636 2/20 0.39
RAB9A P51151 2/20 0.39
NPC1 O15118 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
MLYCD O95822 1/20 0.38
HPGD P15428 2/20 0.37
GAA P10253 1/20 0.37
RIPK1 Q13546 1/20 0.37
TSHR P16473 1/20 0.36
MAPK1 P28482 1/20 0.36
SMN1; SMN2 Q16637 1/20 0.36
HAO1 Q9UJM8 1/20 0.36
AKR1C3 P42330 1/20 0.36
AKR1C2 P52895 1/20 0.36
AKR1C1 Q04828 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4650526 0.87 RIPK1 (0.43) KMT2AMEN1LMNARAB9ANPC1
Benzene SCHEMBL28672020 0.87 RIPK1 (0.43) KMT2AMEN1LMNARAB9ANPC1
SCHEMBL28033176 0.86 ALDH1A1 (0.39) TAS2R14KMT2AMEN1ALDH1A1MAPT
SCHEMBL8898813 0.85 HDAC1 (0.37) KMT2AMEN1ALDH1A1LMNARAB9A
SCHEMBL8897288 0.85 TAS2R14 (0.40) TAS2R14KMT2AMEN1ALDH1A1LMNA
SCHEMBL4651747 0.85 NPC1 (0.41) TAS2R14KMT2AMEN1ALDH1A1LMNA
SCHEMBL8898890 0.85 LMNA (0.42) TAS2R14ALDH1A1LMNAMAPTMLYCD
SCHEMBL8899758 0.85 PPARG (0.48) TAS2R14KMT2AMEN1MAPTRAB9A
SCHEMBL8899013 0.84 TAS2R14 (0.39) TAS2R14KMT2AMEN1ALDH1A1LMNA
SCHEMBL8896958 0.84 TMEM97 (0.41) KMT2AMEN1ALDH1A1LMNAMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-106909024-B Photosensitive resin composition and application thereof 辽宁靖帆新材料有限公司 2020-03-13 CN disclosed
US-5698285-A PHOTOCURABLE THREE BOND CO., LTD. (JP) 1997-12-16 US disclosed
US-5629356-A PHOTOCURABLE COMPOSITION CONTAINING ETHYLENICALLY UNSATURATED PHOTOPOLYMERIZABLE COMPOUND AND THE AMINOACETOPHENONE CIBA GEIGY CORPORATION (US) 1997-05-13 US disclosed
US-5554663-A α-aminoacetophenones as photoinitiators CIBA-GEIGY CORPORATION (US) 1996-09-10 US disclosed
US-5534629-A PHOTOPOLYMERIZATION OF PIGMENTED SYSTEMS, INKS CIBA-GEIGY CORPORATION (US) 1996-07-09 US disclosed
EP-0284561-B1 ALPHA-AMINOACETOPHENONES AS PHOTO INITIATORS CIBA-GEIGY AG (CH) 1993-05-12 EP disclosed
US-5077402-A For photocuring pigmented systems; printing inks, lacquers CIBA-GEIGY CORPORATION (US) 1991-12-31 US disclosed
EP-0284561-A2 Alpha-aminoacetophenones as photo initiators CIBA-GEIGY AG (CH) 1988-09-28 EP disclosed