SCHEMBL890332

SCHEMBL890332

OCc1cc(Br)cc(CO)c1O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 1/20 0.46
TSHR P16473 1/20 0.46
TDP1 Q9NUW8 1/20 0.46
KDM4E B2RXH2 1/20 0.43
CASP6 P55212 1/20 0.43
SHBG P04278 1/20 0.41
GABRA1 P14867 2/20 0.40
GABRB1 P18505 2/20 0.40
GABRA2 P47869 1/20 0.40
GABRB2 P47870 1/20 0.40
PTGDR2 Q9Y5Y4 1/20 0.37
PTPN1 P18031 2/20 0.37
GFER P55789 1/20 0.36
MEN1 O00255 1/20 0.35
ALDH1A1 P00352 1/20 0.35
POLB P06746 1/20 0.35
MAPT P10636 1/20 0.35
KMT2A Q03164 1/20 0.35
PLEC Q15149 1/20 0.35
CYP1A2 P05177 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10910348 0.93 PTPN1 (0.43) CYP3A4TSHRTDP1KDM4ECASP6
SCHEMBL2120858 0.87 CYP3A4 (0.59) CYP3A4TSHRTDP1KDM4ECASP6
SCHEMBL30765098 0.84 MEN1 (0.38) CYP3A4TSHRTDP1KDM4ECASP6
SCHEMBL13623354 0.84 SHBG (0.59) CYP3A4TSHRTDP1KDM4ECASP6
SCHEMBL1630992 0.84 MEN1 (0.38) CYP3A4TSHRTDP1KDM4ECASP6
SCHEMBL293625 0.79 GAA (0.56) TSHRMEN1ALDH1A1MAPTKMT2A
SCHEMBL835866 0.77 KDM4E (0.46) CYP3A4KDM4ECASP6SHBGGABRA1
SCHEMBL9999531 0.77 ACHE (0.48) KDM4ECASP6SHBGGABRA1GABRB2
SCHEMBL26132747 0.77 KDM4E (0.46) CYP3A4KDM4ECASP6SHBGGABRA1
SCHEMBL8409093 0.76 GABRA1 (0.50) CYP3A4TSHRTDP1GABRA1GABRB1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-114195989-B Top anti-reflection coating polymer with trapezoid structure, top anti-reflection coating composition and preparation method thereof 福建泓光半导体材料有限公司 2024-03-15 CN disclosed
EP-4220146-A1 APPARATUS FOR MEASURING ANALYTES WITH AN EXTENDED FLOATING GATE SURFACE AREA Life Technologies Corporation (US) 2023-08-02 EP disclosed
CN-114195989-A Top anti-reflection coating polymer with trapezoidal structure, top anti-reflection coating composition and preparation method thereof 福建泓光半导体材料有限公司 2022-03-18 CN disclosed
US-20210116414-A1 METHODS AND APPARATUS FOR MEASURING ANALYTES Life Technologies Corporation (US) 2021-04-22 US disclosed
EP-2958887-B1 BILATERALLY-SUBSTITUTED TRICYCLIC COMPOUNDS FOR THE TREATMENT OF HUMAN IMMUNODEFICIENCY VIRUS TYPE-1 (HIV-1) INFECTION AND OTHER DISEASES CENTRO DE INVESTIGACIÓN PRÍNCIPE FELIPE (ES) 2018-03-07 EP disclosed
EP-2982437-B1 METHODS AND APPARATUS FOR MEASURING ANALYTES USING LARGE SCALE FET ARRAYS LIFE TECHNOLOGIES CORP (US) 2017-12-06 EP disclosed
US-20170194985-A1 METHODS AND COMPUTER PROGRAM PRODUCTS FOR COMPRESSION OF SEQUENCING DATA Life Technologies Corporation 2017-07-06 US disclosed
US-20170145497-A1 METHODS AND APPARATUS FOR MEASURING ANALYTES USING LARGE SCALE FET ARRAYS Life Technologies Corporation 2017-05-25 US disclosed
US-9586943-B2 Bilaterally-substituted tricyclic compounds for the treatment of human immunodeficiency virus type-1 (HIV-1) infection and other diseases UNIVERSITAT DE VALÈNCIA (ES) 2017-03-07 US disclosed
US-9586943-B2 Bilaterally-substituted tricyclic compounds for the treatment of human immunodeficiency virus type-1 (HIV-1) infection and other diseases UNIVERSITAT DE VALÈNCIA (ES) 2017-03-07 US disclosed
US-20100137143-A1 METHODS AND APPARATUS FOR MEASURING ANALYTES ION TORRENT SYSTEMS INCORPORATED (US) 2010-06-03 US disclosed
WO-2008124571-A2 ANTI-VIRAL COMPOUNDS, COMPOSITIONS AND METHODS PRESIDENT AND FELLOWS OF HARVARD COLLEGE (US) 2008-10-16 WO disclosed
US-7358403-B2 Chiral sensor JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2008-04-15 US disclosed
US-7358403-B2 Chiral sensor JAPAN SCIENCE AND TECHNOLOGY AGENCY (JP) 2008-04-15 US disclosed
EP-1538148-B1 CHIRAL SENSOR JAPAN SCIENCE & TECH AGENCY (JP) 2007-01-10 EP disclosed
EP-0318649-B1 Positive-working radiation-sensitive composistion and radiation-sensitive recording material produced therefrom for high-energy radiation HOECHST AG (DE) 1996-01-03 EP disclosed
US-5403697-A Comprising compound which forms acid after high energy radiation and an acid-cleavable compound, polymeric binder HOECHST AKTIENGESELLSCHAFT (DE) 1995-04-04 US disclosed
EP-0318649-A2 Positive-working radiation-sensitive composistion and radiation-sensitive recording material produced therefrom for high-energy radiation HOECHST AKTIENGESELLSCHAFT (DE) 1989-06-07 EP disclosed
EP-0137241-B1 PROCESS FOR THE PREPARATION OF HYDROXYBENZYLPHOSPHONIUM SALTS BASF Aktiengesellschaft (DE) 1987-01-21 EP disclosed
EP-0137241-A1 Process for the preparation of hydroxybenzylphosphonium salts BASF Aktiengesellschaft (DE) 1985-04-17 EP disclosed