SCHEMBL8903648

SCHEMBL8903648

COc1cccc(S(OS(=O)(=O)c2ccc(C)cc2)(c2ccc(OC(C)(C)C)cc2)c2ccc(OC(C)(C)C)cc2)c1

nearest known ligand 0.41

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
FFAR4 Q5NUL3 1/20 0.41
BCHE P06276 1/20 0.40
ACHE P22303 1/20 0.40
POLB P06746 3/20 0.39
ABCC9 O60706 1/20 0.39
ABCC8 Q09428 1/20 0.39
KCNJ11 Q14654 1/20 0.39
KCNJ8 Q15842 1/20 0.39
MAPT P10636 3/20 0.39
KEAP1 Q14145 1/20 0.39
NFE2L2 Q16236 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
HTT P42858 1/20 0.39
TDP1 Q9NUW8 1/20 0.39
PGR P06401 2/20 0.38
ALDH1A1 P00352 2/20 0.38
TP53 P04637 1/20 0.38
MCOLN3 Q8TDD5 1/20 0.37
CNR1 P21554 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8077093 0.90 HTT (0.40) FFAR4BCHEACHEL3MBTL1HTT
SCHEMBL8078746 0.89 HTT (0.41) BCHEACHEKEAP1NFE2L2L3MBTL1
SCHEMBL6757964 0.89 HTT (0.41) BCHEACHEKEAP1NFE2L2L3MBTL1
SCHEMBL8920104 0.89 HTT (0.44) BCHEACHEPOLBABCC9ABCC8
SCHEMBL8494335 0.89 ALDH1A1 (0.46) FFAR4BCHEACHEMAPTALDH1A1
SCHEMBL3141175 0.87 FFAR4 (0.47) FFAR4BCHEACHEPOLBMAPT
SCHEMBL64770 0.86 HTT (0.45) BCHEACHEMAPTKEAP1NFE2L2
SCHEMBL65270 0.86 HTT (0.45) BCHEACHEMAPTKEAP1NFE2L2
SCHEMBL64968 0.86 BCHE (0.43) FFAR4BCHEACHEL3MBTL1HTT
SCHEMBL8496289 0.86 BCHE (0.43) FFAR4BCHEACHEL3MBTL1HTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5624787-A NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-04-29 US claimed
US-5633409-A POSITIVE RESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-05-27 US disclosed
US-5624787-A NITROGENOUS COMPOUND AND SULFONIUM COMPOUND FOR POSITIVE PHOTORESISTS SHIN-ETSU CHEMICAL CO., LTD. (JP) 1997-04-29 US disclosed
EP-0665220-A1 Novel sulfonium salt and chemically amplified positive resist composition SHIN-ETSU CHEMICAL CO., LTD. (JP) 1995-08-02 EP disclosed